Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Te-Fu Chang"'
Autor:
Te-Fu Chang, 張德富
96
Diamond films were synthesized on Si, Ge and SixGe1-x substrates by bias-enhanced nucleation in microwave plasma chemical vapor deposition. In this work, we have studied growth of oriented diamond films on various substrates by bias method. T
Diamond films were synthesized on Si, Ge and SixGe1-x substrates by bias-enhanced nucleation in microwave plasma chemical vapor deposition. In this work, we have studied growth of oriented diamond films on various substrates by bias method. T
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/39608676042514907783
Publikováno v:
International Symposium for Testing and Failure Analysis.
This research sets up failure analysis flow to verify failure mechanisms and root causes of different kinds of contact leakage. This flow mainly uses EBIC, C-AFM and nano-probing to do fault isolation and confirm electrical failure mechanisms. Approp
Autor:
Chih-Hsun Chu, Shih-Hsin Chang, Te-Fu Chang, Chih-Feng Chiang, Rung-Jiun Lin, Chia-Hsiang Yen, Wan-Yi Liu, Pau-Sheng Kuo
Publikováno v:
Microelectronics Reliability. 64:387-389
Precise location of leakage in a P-well/N-well junction has been identified by an AFM (atomic force microscope)-based nanoprober. In order to provide the accurate position of the failure for further analysis, a new method was proposed by combining na
Autor:
Tsai Bin-Siang, Te-Fu Chang, Wu Hsiao-Che, Ming-Yen Li, Haw Yen, Mei-Yun Su, Tsung-Hsun Yang, Tsai Wen-Li, Poyo Chuang
Publikováno v:
Microelectronic Engineering. 85:1502-1510
TiN/Al-0.5Cu/Ti film stacks deposited on SiO"2 substrate were studied by X-ray diffraction and electron microscopy to clarify the effects of the chamber long stay and post-deposition annealing on the morphology evolution. Experimental results indicat
Plasma FIB DualBeam Delayering for Atomic Force NanoProbing of 14 nm FinFET Devices in an SRAM Array
Autor:
Sean Zumwalt, Trevan Landin, Shih-Hsin Chang, Roger Alvis, Andrew Norman Erickson, Sinjin Dixon-Warren, Chia-Hsiang Yen, Chih-Hsun Chu, Wan-Yi Liu, Pau-Sheng Kuo, Te-Fu Chang, Peter Carleson, Oleg Sidorov, Chad Rue
Publikováno v:
International Symposium for Testing and Failure Analysis.
The result of applying normal xenon ion beam milling combined with patented DX chemistry to delayer state-of-theart commercial-grade 14nm finFETs has been demonstrated in a Helios Plasma FIB DualBeam™. AFM, Conductive-AFM and nano-probing with the
Autor:
Li Chang, Chih Wei Lin, Hou-Guang Chen, Yen Cheng Chao, Jhih Kun Yan, Chia Ling Wu, Te Fu Chang
Publikováno v:
Thin Solid Films. 498:137-141
ZnO nanorods were grown on Si substrates by metal-organic chemical vapor deposition (CVD). The ZnO nanorods were characterized by scanning electron microscopy, transmission electron microscopy (TEM), and X-ray diffraction. It was found that highly or
Autor:
Chien Yu Hsu, Li-Chyong Chen, Kuei-Hsien Chen, Li Chang, Oliver Chyan, Te Fu Chang, Lu-Sheng Hong, Ming Chuan Su, Chia-Liang Sun
Publikováno v:
Chemistry of Materials. 17:3749-3753
The structure and electrochemical properties of arrayed nitrogen-containing carbon nanotube (CNx NT)−platinum nanoparticle (Pt NP) composites directly grown on Si substrates have been investigated. The CNx nanotube arrays were grown by microwave-pl
Autor:
Li Chang, Te Fu Chang
Publikováno v:
Diamond and Related Materials. 13:2088-2091
Highly oriented (100) diamond films have been successfully grown on Si x Ge 1− x (100) thin films by bias enhanced nucleation (BEN) in microwave plasma chemical vapor deposition (MPCVD) system. Raman spectra show the 1332 cm −1 peak which proves
Autor:
Li Chang, Te Fu Chang
Publikováno v:
Diamond and Related Materials. 11:509-512
The growth of textured diamond films on Si (111) and carbon face 6HSiC (0001) has been achieved by positive bias-enhanced-nucleation in microwave plasma chemical vapor deposition. A bias voltage of +100 to +300 V, 3% CH4 concentration in bias step
Publikováno v:
Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).