Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Te Jui Yen"'
Publikováno v:
Nanomaterials, Vol 12, Iss 2, p 261 (2022)
High-performance p-type thin-film transistors (pTFTs) are crucial for realizing low-power display-on-panel and monolithic three-dimensional integrated circuits. Unfortunately, it is difficult to achieve a high hole mobility of greater than 10 cm2/V·
Externí odkaz:
https://doaj.org/article/88a39cd28e5c4d57a92646e583041c85
Publikováno v:
Nanomaterials, Vol 11, Iss 1, p 92 (2021)
Implementing high-performance n- and p-type thin-film transistors (TFTs) for monolithic three-dimensional (3D) integrated circuit (IC) and low-DC-power display is crucial. To achieve these goals, a top-gate transistor is preferred to a conventional b
Externí odkaz:
https://doaj.org/article/f804b23de93b48a78c0fe5759b601363
Publikováno v:
Nanomaterials, Vol 10, Iss 11, p 2145 (2020)
Metal-oxide thin-film transistors (TFTs) have been implanted for a display panel, but further mobility improvement is required for future applications. In this study, excellent performance was observed for top-gate coplanar binary SnO2 TFTs, with a h
Externí odkaz:
https://doaj.org/article/f183a9ef252b45a29a78c14c4ab0d954
Publikováno v:
SID Symposium Digest of Technical Papers. 53:393-395
Publikováno v:
Advanced Materials Technologies. 8
Publikováno v:
SID Symposium Digest of Technical Papers. 52:292-294
Publikováno v:
IEEE Electron Device Letters. 40:909-912
Using a novel ultraviolet (UV) irradiation method, we processed a high-performance thin-film transistor (TFT) at low temperatures. Satisfactory device integrity that was demonstrated by high field-effect mobility values of 92 and 43 cm2/Vs, small sub
Publikováno v:
Nanomaterials, Vol 11, Iss 1401, p 1401 (2021)
Nanomaterials
Volume 11
Issue 6
Nanomaterials
Volume 11
Issue 6
Large device variation is a fundamental challenge for resistive random access memory (RRAM) array circuit. Improved device-to-device distributions of set and reset voltages in a SiNx RRAM device is realized via arsenic ion (As+) implantation. Besides
Publikováno v:
Nanomaterials
Large device variation is a fundamental challenge for resistive random access memory (RRAM) array circuit. Improved device-to-device distributions of set and reset voltages in a SiNx RRAM device is realized via arsenic ion (As+) implantation. Besides
Publikováno v:
Nanomaterials
Volume 11
Issue 1
Nanomaterials, Vol 11, Iss 92, p 92 (2021)
Volume 11
Issue 1
Nanomaterials, Vol 11, Iss 92, p 92 (2021)
Implementing high-performance n- and p-type thin-film transistors (TFTs) for monolithic three-dimensional (3D) integrated circuit (IC) and low-DC-power display is crucial. To achieve these goals, a top-gate transistor is preferred to a conventional b