Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Tatum Kobayashi"'
Autor:
Marie Hellion, Teruaki Ogawa, Tracy K. Lindsay, Cheng Bai Xu, Jason A. DeSISTO, Tatum Kobayashi, Young Cheol Bae, Robert J. Kavanagh, Tsutomu Tanaka, George W. Orsula
Publikováno v:
SPIE Proceedings.
It was found that the structure of a matrix polymer has strong influence on the PEB sensitivity of 193nm photoresists. As reported, photoresists containing CO polymers exhibited superior property in terms of PEB sensitivity to photoresists formulated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d9c4fac32a06f496c9751a5473632e5
https://doi.org/10.1117/12.537451
https://doi.org/10.1117/12.537451
Autor:
James W. Thackeray, Robert J. Kavanagh, Tatum Kobayashi, Young Cheol Bae, Timothy G. Adams, George G. Barclay, Patrick J. Bolton, Lujia Bu, Nick Pugliano
Publikováno v:
Advances in Resist Technology and Processing XX.
Surface roughness of 193 nm resists after a dry etch process is one of the critical issues in the implementation of 193 nm lithography to sub- 100 nm technology nodes. Compared to commercial 248 nm resists, 193 nm photoresists exhibit significant rou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ee98e8b0303abb4a810c3d133e051c4
https://doi.org/10.1117/12.483761
https://doi.org/10.1117/12.483761