Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Tatsuyuki Nishimiya"'
Autor:
Tsukasa Yamane, Hiromu Takatsuka, Kiichiro Uchino, Hiroshi Muta, Yoshinobu Kawai, Yoshiaki Takeuchi, Tatsuyuki Nishimiya, Yasuhiro Yamauchi
Publikováno v:
Thin Solid Films. 519:6931-6934
The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge reg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a8fdfd1d8a9c00fb83169405091d2ff
https://doi.org/10.1016/j.tsf.2011.01.379
https://doi.org/10.1016/j.tsf.2011.01.379
Autor:
Tatsuyuki Nishimiya, Tsukasa Yamane, Hiroshi Muta, Yoshinobu Kawai, Sachiko Nakao, Kiichiro Uchino, Yasuhiro Yamauchi, Hiromu Takatsuka, Yoshiaki Takeuchi
Publikováno v:
Surface and Coatings Technology. 205:S411-S414
A SiH 4 /H 2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60 MHz. It was found that the ion saturation curren
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2abb6e0873e4c3625bb77556c12acfa5
https://doi.org/10.1016/j.surfcoat.2011.02.043
https://doi.org/10.1016/j.surfcoat.2011.02.043
Autor:
Y. Takeuchi, T. Shioya, Yasuhiro Yamauchi, Hiromu Takatsuka, Yoshinobu Kawai, Hiroshi Muta, Tatsuyuki Nishimiya
Publikováno v:
Thin Solid Films. 516:4430-4434
We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b7f723e1bdf32f6ff4895adbc683d52
https://doi.org/10.1016/j.tsf.2007.10.016
https://doi.org/10.1016/j.tsf.2007.10.016
Autor:
Yuichi Kai, Yoshinobu Kawai, Hiromu Takatsuka, Yasuhiro Yamauchi, Tatsuyuki Nishimiya, Yoshiaki Takeuchi, Hiroshi Muta
Publikováno v:
Plasma Processes and Polymers. 4:S991-S994
A SiH4/H2 VHF plasma with a frequency of 60 MHz was produced with a multi-rod electrode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6600e29464e8819aada581f40652dd38
https://doi.org/10.1002/ppap.200732314
https://doi.org/10.1002/ppap.200732314
Autor:
Akio Tokura, Kenji Muta, S Fujii, Y Sakai, Osamu Tadanaga, Tatsuyuki Nishimiya, Hirokazu Takenouchi, Y Tsumura, M Yonemura, N Kamiyama, K Kenmotsu, Masashi Abe
Publikováno v:
Applied Optics. 55:6887
We have investigated 4-μm-band SO3 absorption lines for in situSO3 detection using a mid-infrared laser source based on difference frequency generation in a quasi-phase-matched LiNbO3 waveguide. In the wavelength range of 4.09400–4.10600 μm, ther
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d5b6f7d70ef7269d178002e21c425db
https://doi.org/10.1364/ao.55.006887
https://doi.org/10.1364/ao.55.006887
Autor:
Tatsuyuki Nishimiya, Akihisa Matsuda, B. Claflin, Michio Kondo, Makoto Fukawa, Toshihiro Kamei, G. Lucovsky, Masao Isomura
Publikováno v:
MRS Proceedings. 507
Ultra clean plasma CVD process opens the doorway to clarify the role of impurities in the growth process of μc-Si:H. A reduction of impurity levels during the growth extends the temperature range for crystalline formation to lower side, i.e., high-c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dfb49e1c51ad558081e096c949a28f68
https://doi.org/10.1557/proc-507-867
https://doi.org/10.1557/proc-507-867
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