Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Tatsushi Ohyama"'
Publikováno v:
Free Radical Research. 51:739-748
We investigated aqueous solutions containing nitrite ions and DMPO (5,5-dimethyl-1-pyrroline-N-oxide) by electron spin resonance (ESR) in the pH range from 1 to 6. A DMPO-OH signal was observed below pH 3.0 in the presence of nitrite ions, whereas in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b9e794e3d508837b83fa0d4bebe165e7
https://doi.org/10.1080/10715762.2017.1369536
https://doi.org/10.1080/10715762.2017.1369536
Autor:
Tatsuya Shimoda, Keisuke Ohdaira, Hiroko Murayama, Takashi Masuda, Tatsushi Ohyama, Isao Yoshida, Akira Terakawa
Publikováno v:
Thin Solid Films. 575:100-102
The film properties and solar cell performances of hydrogenated amorphous silicon (a-Si:H) fabricated by a newly developed non-vacuum process “Liquid-Si printing method” were systematically investigated by comparing to the conventional plasma-che
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bc84b8c55a54913a0084ba94dcc2d92
https://doi.org/10.1016/j.tsf.2014.10.034
https://doi.org/10.1016/j.tsf.2014.10.034
Autor:
Keisuke Watanabe, Kaori Misawa, Hayato Nakashima, Mamoru Arimoto, Toshikazu Ohno, Tatsushi Ohyama, Yugo Nose, Ryu Shimizu
Publikováno v:
The Journal of The Institute of Image Information and Television Engineers. 64:347-352
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8900a5d95611a96891f92be1960ab820
https://doi.org/10.3169/itej.64.347
https://doi.org/10.3169/itej.64.347
Autor:
Kazuhiro Suzuki, Tatsushi Ohyama, Toshikazu Ohno, Kuniyuki Tani, Mamoru Arimoto, Hayato Nakashima, Ryu Shimizu, Keisuke Watanabe, Yugo Nose, Kaori Misawa
Publikováno v:
ISSCC
A highly sensitive charge-multiplication CMOS image sensor was fabricated. The 10 ?m pixel pitch and CIF image format sensor has an array of unit pixels comprising photodiode region, charge multiplication unit, and source follower charge-to-voltage c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49b10eccb59ca45daf82a22a21db6cc4
https://doi.org/10.1109/jssc.2009.2035541
https://doi.org/10.1109/jssc.2009.2035541
Autor:
Hideki Yamauchi, Shigeyuki Okada, Kazuhiko Taketa, Tatsushi Ohyama, Yuh Matsuda, Tsugio Mori, Shin'ichiro Okada, Tsuyoshi Watanabe, Yoshihiro Matsuo, Yuji Yamada, Tatsuya Ichikawa, Yoshifumi Matsushita
Publikováno v:
2003 IEEE International Solid-State Circuits Conference, 2003. Digest of Technical Papers. ISSCC..
A one-chip image processor for next-generation digital cameras and broadband PDA multimedia mobile phones is described. It is capable of processing JPEG2000 data with 30 frames/s and a 27 MHz operating frequency. The process is fabricated in 0.25 /sp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51f83bd8eaf1e645707a6f461fa880fe
https://doi.org/10.1109/isscc.2003.1234201
https://doi.org/10.1109/isscc.2003.1234201
Autor:
Hideyuki Takagishi, Akira Terakawa, Takashi Masuda, Tatsushi Ohyama, Keisuke Ohdaira, Tatsuya Shimoda, Hiroko Murayama
Publikováno v:
Japanese Journal of Applied Physics. 53:05FM06
The film property distributions along the thickness direction of the catalyst-generated atomic hydrogen (Cat-H*) treatment effects on hydrogenated amorphous silicon (a-Si:H) fabricated by plasma-enhanced chemical vapor deposition (plasma-CVD) and liq
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0937a8b802c529eb72deaccd5c363869
https://doi.org/10.7567/jjap.53.05fm06
https://doi.org/10.7567/jjap.53.05fm06
Publikováno v:
Journal of the Magnetics Society of Japan. 15:S2_81-86
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75febdba72a9e478d9597fb7ce26cd59
https://doi.org/10.3379/jmsjmag.15.s2_81
https://doi.org/10.3379/jmsjmag.15.s2_81
Publikováno v:
Journal of the Physical Society of Japan. 56:3240-3247
The temperature dependences of the electrical resistivity ρ and the thermoelectric power S of LaAg 1- x In x , CeAg 1- x In x and RAg (R=Pr, Nd, Gd and Y) compounds have been investigated. In addition, the Hall coefficient R 0 of LaAg 1- x In x has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39bcd0b8d0b16bc19cd2a6757bfac1b9
https://doi.org/10.1143/jpsj.56.3240
https://doi.org/10.1143/jpsj.56.3240
Autor:
Hiroko Murayama, Tatsushi Ohyama, Akira Terakawa, Hideyuki Takagishi, Takashi Masuda, Keisuke Ohdaira, Tatsuya Shimoda
Publikováno v:
Japanese Journal of Applied Physics; May2014, Vol. 53 Issue 5S1, p1-1, 1p