Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Tatsuro Nagahara"'
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
EMD Performance Materials provides a broad material portfolio for photolithography, Chemical Shrink and EUV Rinse materials are two categories of aqueous materials enabling advanced patterning. Chemical Shrink materials generate an additional layer o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ff23e5f691198da5c25367f48a42015
https://doi.org/10.1117/12.2516031
https://doi.org/10.1117/12.2516031
Publikováno v:
Journal of Photopolymer Science and Technology. 29:761-764
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d974ed1a7fff067fa17d0a14402c2f36
https://doi.org/10.2494/photopolymer.29.761
https://doi.org/10.2494/photopolymer.29.761
Publikováno v:
Journal of Photopolymer Science and Technology. 29:745-748
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9527ccbdc5ea9d852f66a552921dfaee
https://doi.org/10.2494/photopolymer.29.745
https://doi.org/10.2494/photopolymer.29.745
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography is one of the promising high volume manufacturing processes for devices below 7 nm node and beyond. However, resist pattern collapse is one of the hurdles in achieving a comfortable process margin/window for resist pat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ead4ddc7f944c9d56553405de1644e7
https://doi.org/10.1117/12.2257393
https://doi.org/10.1117/12.2257393
Publikováno v:
SPIE Proceedings.
In this paper, we will discuss the improvement of resist pattern roughness on NTD (Negative Tone Development) resist by chemical shrink process. Chemical shrink process is one of the most practical approaches to achieve small feature size CH (Contact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5b640a565ed252bac598b875a8ebb62
https://doi.org/10.1117/12.2218402
https://doi.org/10.1117/12.2218402
Publikováno v:
Journal of Photopolymer Science and Technology. 23:225-230
Perhydropolysilazane (PHPS) is widely used as high cure temperature pre-ceramic polymer. In this paper, we report the conversion of PHPS films into solvent insoluble amorphous-silicon-nitride at room temperature in an inert atmosphere by vacuum ultra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3bc29c17240f3a33708c3cb69ca2ad9a
https://doi.org/10.2494/photopolymer.23.225
https://doi.org/10.2494/photopolymer.23.225
Autor:
Yoshihiro Miyamoto, John P. Sagan, Yuko Horiba, Takafumi Kinuta, Takashi Sekito, Tatsuro Nagahara, Shinji Tarutani
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Negative tone shrink materials (NSM) suitable for resolution enhancement of negative tone development (NTD) 193nm immersion resists have been developed. While this technology is being expanded to integrated circuits (IC) manufacturing, there still ha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2a1c34f16c3081d0a86c2d4e8ff830a
https://doi.org/10.1117/12.2085736
https://doi.org/10.1117/12.2085736
Publikováno v:
SPIE Proceedings.
In this paper, we discuss a new approach to improve the resist roughness, which is applied after the lithography process. The ERC (Edge Roughness Controller) process is composed of two steps, 1) To deliver resist softening material at the resist surf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a1472e0dfff9da965079164f638a0d3
https://doi.org/10.1117/12.2085713
https://doi.org/10.1117/12.2085713
Publikováno v:
SPIE Proceedings.
Negative tone shrink materials (NSM) suitable for resolution enhancement of negative tone development (NTD) 193nm immersion resists have been developed. While this technology is being applied to integrated circuits (IC) manufacturing, reduction of sh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc3415b7064fbb47a56106ecf798405b
https://doi.org/10.1117/12.2046311
https://doi.org/10.1117/12.2046311
Autor:
Naoki Matsumoto, Tatsuro Nagahara, Maki Ishii, Yoshihiro Miyamoto, Georg Pawlowski, Yukie Takemura, Kazuma Yamamoto, Masahiro Ishii, Go Noya
Publikováno v:
Alternative Lithographic Technologies V.
The negative tone development (NTD) process has proven benefits for superior imaging performance in 193nm lithography. Shrink materials, such as AZ® RELACS® have found widespread use as a resolution enhancement technology in conventional 248nm (DUV
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d81980f62aed503475eb6d5348d11c92
https://doi.org/10.1117/12.2012077
https://doi.org/10.1117/12.2012077