Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Tatsuhiko Tanimura"'
Autor:
Koji Akiyama, Tatsuhiko Tanimura, Yoshihiro Hirota, Takanobu Kaitsuka, Jun Sato, Chihhsiang Hsiao
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 28:278-282
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01cac180e890769d3ac374da7b8e2d0d
https://doi.org/10.1109/tsm.2015.2444404
https://doi.org/10.1109/tsm.2015.2444404
Autor:
Sara Aoki, Masaki Koizumi, Masaki Sano, Tadahiro Ishizaka, Tatsuhiko Tanimura, Kentaro Shiraga, Masato Koizumi, Cheonsoo Han, Koji Akiyama, Seokhyoung Hong
Publikováno v:
2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC).
Advanced Sequential Flow Deposition (ASFD) TiON electrode was developed and mechanism of leakage current reduction with ASFD TiON electrode was studied. ASFD TiON film was fabricated by repeating TiN layer formation and oxidation. Resistivity and cry
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbd97aee047e99b78fd5881f61002743
https://doi.org/10.1109/iitc-amc.2016.7507724
https://doi.org/10.1109/iitc-amc.2016.7507724
Autor:
Satoshi Toyoda, Tatsuhiko Tanimura, Hiroyuki Kamada, Hiroshi Kumigashira, Masaharu Oshima, Toshihiro Ohtsuka, Yoshifumi Hata, Masaaki Niwa
Publikováno v:
ECS Meeting Abstracts. :723-723
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1a2f52ce626321722eef61ca01b4215
https://doi.org/10.1149/ma2009-01/15/723
https://doi.org/10.1149/ma2009-01/15/723
Autor:
Tatsuhiko Tanimura, Satoshi Toyoda, Hiroshi Kumigashira, Masaharu Oshima, Kazuhito Ikeda, Guo Lin Liu, Z Liu
Publikováno v:
ECS Meeting Abstracts. :653-653
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::759642323e9e4490d2bffc439295aba0
https://doi.org/10.1149/ma2008-01/16/653
https://doi.org/10.1149/ma2008-01/16/653