Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Tatjana Widerschpan"'
Autor:
Robert Clayton Wheland, Roger H. French, Nicholas J. Turro, David A. Dixon, Steffen Jockusch, Marius Ivan, Tatjana Widerschpan, Kwangjoo Lee, Jun Li, Paul M. Zimmerman, M. F. Lemon, André M. Braun
Publikováno v:
Journal of the American Chemical Society. 127(23)
The use of 157 nm as the next lower wavelength for photolithography for the production of semiconductors has created a need for transparent and radiation-durable polymers for use in soft pellicles, the polymer films which protect the chip from partic
Autor:
Robert Clayton Wheland, Tatjana Widerschpan, Nicholas J. Turro, Paul Zimmerman, Roger H. French, Steffen Jockusch, M. F. Lemon, André M. Braun, Kwangjoo Lee
Publikováno v:
SPIE Proceedings.
The advance of 157 nm as the next photolithographic wavelength has created a need to for transparent and radiation durable polymers for the use as pellicles. The most promising materials for the pellicles are fluorinated polymers, but the currently a