Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Tasuku Matsumiya"'
Autor:
Yoshinori Suzuki, Katsumi Ohmori, Takaya Maehashi, Rina Maeda, Takahiro Dazai, Chiharu Hirano, Teruaki Hayakawa, Takehiro Seshimo, Yoshiyuki Utsumi, Tasuku Matsumiya
Publikováno v:
Polymer Journal. 48:407-411
Three types of bottom surface layers (BSLs-A, B, C) with different surface properties and a top-coat (TC-A) were applied to investigate perpendicular orientation control of PMMA-b-PMAPOSS domains in the thin films with thermal annealing. The combinat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfffcf12b92050af6536066468c8c607
https://doi.org/10.1038/pj.2015.116
https://doi.org/10.1038/pj.2015.116
Publikováno v:
Journal of Photopolymer Science and Technology. 29:675-678
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31bfaf23954b509480760119ae4092f3
https://doi.org/10.2494/photopolymer.29.675
https://doi.org/10.2494/photopolymer.29.675
Autor:
Paul F. Nealey, Takehiro Seshimo, Hitoshi Yamano, Paulina Rincon-Delgadillo, Takahiro Dazai, Tasuku Matsumiya, Xuanxuan Chen, Ken Miyagi, Akiya Kawaue, Takehito Seo, Katsumi Ohmori, Takaya Maehashi, Roel Gronheid
Publikováno v:
Journal of Photopolymer Science and Technology. 29:667-670
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fa38289c825fe35c0150f717e957890d
https://doi.org/10.2494/photopolymer.29.667
https://doi.org/10.2494/photopolymer.29.667
Autor:
Tomotaka Yamada, Katsumi Ohmori, Takehiro Seshimo, Tsuyoshi Kurosawa, Tasuku Matsumiya, Hitoshi Yamano, Ken Miyagi
Publikováno v:
SPIE Proceedings.
Directed self-assembly (DSA) of block copolymers (BCPs) with conventional lithography is being thought as one of the potential patterning solution for future generation devices manufacturing. New BCP platform is required to obtain resolution below 10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ea2227e264ffb9d69aa93b52438c503
https://doi.org/10.1117/12.2218243
https://doi.org/10.1117/12.2218243
Autor:
Xuanxuan Chen, Paul F. Nealey, Paulina Rincon-Delgadillo, Tasuku Matsumiya, Akiya Kawaue, Takaya Maehashi, Takehito Seo, Roel Gronheid
Publikováno v:
SPIE Proceedings.
Directed self-assembly of block copolymers is a promising candidate to address grand challenges towards new generations of low-cost, high-resolution nanopatterning technology. Over the past decade, poly(styrene-b-methyl methacrylate) (PS-b-PMMA) has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6eb8d7d26a97a0c801e56cd741c26863
https://doi.org/10.1117/12.2220420
https://doi.org/10.1117/12.2220420
Autor:
Masaru Takeshita, Hirokuni Saito, Jiro Yokoya, Ryoichi Takasu, Tasuku Matsumiya, Katsumi Ohmori, Tsuyoshi Nakamura, Yasuhiro Yoshii
Publikováno v:
Journal of Photopolymer Science and Technology. 23:205-209
Pattern collapse becomes one of the serious issues for critical patterning process below 45nm half pitch. Many reports have been published in recent days to investigate pattern collapse mechanism. There are factors such as capillary force, hardness,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aeae9c2573e7ba60083c8da748d16562
https://doi.org/10.2494/photopolymer.23.205
https://doi.org/10.2494/photopolymer.23.205
Autor:
Yoshitaka Komuro, Masahito Yahagi, Tasuku Matsumiya, Ken Miyagi, Akiya Kawaue, Hitoshi Yamano, Katsumi Ohmori, Taku Hirayama, Issei Suzuki, Tsuyoshi Kurosawa, Takaya Maehashi
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Directed Self-Assembly (DSA) of Block Co-Polymer (BCP) with conventional lithography is being thought as one of the potential patterning solution for future generation devices manufacturing. Many studies have been reported to fabricate the aligned pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::233f0252b86d9f163a4e0c984d6b37e1
https://doi.org/10.1117/12.2087009
https://doi.org/10.1117/12.2087009
Autor:
Kenichiro Miyashita, Ken Miyagi, Tasuku Matsumiya, Katsumi Ohmori, Daiju Shiono, Tsuyoshi Kurosawa
Publikováno v:
Alternative Lithographic Technologies V.
We have prepared and analyzed neutralization layer material to perform perpendicular morphology of Poly (styrene-block-methyl methacrylate) (PS- b -PMMA) as Block-Co-Polymers (BCPs). Neutralization layer surface property is optimized by changing hydr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f8132719d89ea8a8c1b2d2aac295041
https://doi.org/10.1117/12.2011638
https://doi.org/10.1117/12.2011638
Autor:
Hiroshi Arimoto, Naoki Yamashita, Tadayoshi Watanabe, Fumihiro Koba, Yoshihisa Matsubara, Daisuke Kawana, Seiichi Tagawa, Eiichi Soda, Mitsuru Sato, Kazuyuki Matsumaro, Yasushi Fujii, Takahiro Kozawa, Tasuku Matsumiya, Katsumi Ohmori
Publikováno v:
SPIE Proceedings.
In this study, we have demonstrated a resist process to fabricate sub 45-nm lines and spaces (L&S) patterns (1:1) by using electron projection lithography (EPL) for a back-end-of-line (BEOL) process for 45-nm technology node. As a starting point we t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::324d71bc724a77c1758c79dc74c57319
https://doi.org/10.1117/12.655976
https://doi.org/10.1117/12.655976
Publikováno v:
SPIE Proceedings.
The Electron Projection Lithography (EPL) has already presented high resolution capabilities and been developed as one of the candidates of post optical lithography. However, much discussion has not been made for resist chemistry, especially on outga
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2af8dc65594ea00ebb73b811aa7284c1
https://doi.org/10.1117/12.536168
https://doi.org/10.1117/12.536168