Zobrazeno 1 - 10
of 65
pro vyhledávání: '"Tara Prasanna Dash"'
Publikováno v:
World Journal of Engineering. 18:841-850
Purpose Static VAR compensators (SVC) have been recognized to be one of the most important flexible AC transmission systems devices used for mitigating the low-frequency electrochemical oscillations occurring in the system and for reactive power comp
Publikováno v:
SN Applied Sciences, Vol 3, Iss 5, Pp 1-13 (2021)
Vertically stacked horizontal nanosheet gate-all-around transistors seem to be one of the viable solutions toward scaling down below sub-7nm technology nodes. In this work, we compare electrical performance, including variability studies of several h
Publikováno v:
Nanoscience & Nanotechnology-Asia. 10:447-456
Background:: In nano and microelectronics, device performance enhancement is limited by downscaling. Introduction of intentional mechanical stress is a potential mobility booster to overcome these limitations. This paper explores the key design chall
Publikováno v:
Journal of the Society for Information Display. 29:130-142
Publikováno v:
Journal of King Saud University - Engineering Sciences. 32:27-41
This work presents a novel control technique for proportional power sharing among parallel VSCs connected to an islanded Microgrid in a distributed generation system consisting of Photovoltaic (PV) and Solid Oxide Fuel Cell (SOFC) as two micro-source
Publikováno v:
2021 International Conference in Advances in Power, Signal, and Information Technology (APSIT).
Publikováno v:
Energies, Vol 14, Iss 5773, p 5773 (2021)
In recent years, multilevel inverters (MLIs) have emerged to be the most empowered power transformation technology for numerous operations such as renewable energy resources (RERs), flexible AC transmission systems (FACTS), electric motor drives, etc
Publikováno v:
Journal of Electronic Materials. 48:6742-6752
The performance of advanced nanoscale devices is limited by different process variability issues, including patterning proximity effects. Most manufactured fin-shaped field-effect transistors (FinFETs) have some imperfections in the fin shape due to
Publikováno v:
Journal of Electronic Materials. 48:5348-5362
The epitaxially grown SiGe source/drain stressor (e-SiGe) technique has emerged to be a consistent performance booster for advanced devices below the 14 nm technology node. At nanoscale, the omnipresent residual stress is now becoming an important so
Publikováno v:
2021 Devices for Integrated Circuit (DevIC).
The high-power GaN High Electron Mobility Transistors (HEMT) are used for next-generation high-speed R.F. applications. This work intends to simulate and analyze the AlxGa1-xN/GaN HEMT to obtain two-dimensional electron gas (2DEG). The variation of 2