Advanced Gate and Stack Dielectric Characterization with FastGate® Technology.

Autor: Hillard, Robert J., Tan, Louison C., Reid, Kimberly G.

Publikováno v: AIP Conference Proceedings; 9/28/2009, Vol. 1173 Issue 1, p89-93, 5p, 1 Black and White Photograph, 1 Diagram, 1 Chart, 9 Graphs

Electrical characterization of silicon-on-insulator structures with a nondamaging elastic-metal gate.

Autor: Hillard, Robert J., Howland, William H., Tan, Louison C., Ye, Win

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 1, p450-454, 5p