Zobrazeno 1 - 2
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pro vyhledávání: '"Tammo Uitterdijk"'
Autor:
Tammo Uitterdijk, Hitoshi Mishiro, Jae-hyuk Chang, Kaname Okada, Orlando Serapio Cicilia, Andrew Grenville, Peter De Bisschop, Roxann L. Engelstad, Eric P. Cotte, Chris K. Van Peski, Shinya Kikugawa, Richard Joseph Bruls, Michael Kocsis, Kazushige Ohta
Publikováno v:
SPIE Proceedings.
For 157 nm lithography the pellicle material will be most probably a 800 μm thick inorganic (fluorine doped fused silica) plate instead of a standard thin (~ 1 μm) organic (polymer) film. The thickness of the pellicle makes it an additional optical
Autor:
Theo Modderman, Stephane Dana, Birgit Mecking, Herman Boom, Timothy O'Neil, Jan Mulkens, Tammo Uitterdijk, Hans Jasper, Martin Brunotte, Harry Sewell, Toralf Gruner
Publikováno v:
SPIE Proceedings.
This paper presents the progress of the 157 nm lithography program at ASML and Carl Zeiss SMT in 2003. The major technical problems are solved and the first full field 157 nm scanner was shipped to the industry for starting the process development. T