Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Takuya Nakaue"'
Publikováno v:
Solid State Ionics. 175:541-544
We have developed a direct patterning method to form Cu 2 O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO 4 and chelating agent. Cu 2 O pattern on the titanium substrates
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ffde11705012213fdae9eea2c502040
https://doi.org/10.1016/j.ssi.2004.01.081
https://doi.org/10.1016/j.ssi.2004.01.081
Autor:
Yoshinori Nakagawa, Ryo Teranishi, Tomoaki Watanabe, Takuya Nakaue, Seung-Wan Song, Masahiro Yoshimura, Takeshi Fujiwara
Publikováno v:
Chemical Physics Letters. 365:369-373
We have developed a new method to directly fabricate lithium cobalt oxide (LiCoO 2 ) films onto porous films by an electrodeposition method in solutions at low temperature. A set of porous substrate films consisting of a PTFE membrane-filter and pape
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b32a01b3a5d0d4900864be2452cdc49
https://doi.org/10.1016/s0009-2614(02)01444-6
https://doi.org/10.1016/s0009-2614(02)01444-6
Autor:
Mario Dellagiovanna, Osamu Takaoka, Stephane Benard, Ryoji Hagiwara, Hidenori Yoshioka, Atsushi Uemoto, Takuya Nakaue, Hiroyuki Miyashita, Syuichi Kikuchi, Shiaki M. Murai
Publikováno v:
SPIE Proceedings.
For almost a decade Nanomachining application has been studied and developed to repair next generation of photomasks. This technique, based on Atomic Force Microscopy (AFM), applies a mechanical removing of the defects with almost negligible quartz-d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3e682b87dba378354b69d7863361471
https://doi.org/10.1117/12.746405
https://doi.org/10.1117/12.746405
Autor:
Futoshi Iwata, Toshihiko Asao, Kazutaka Saigo, Shuichi Kikuchi, Osamu Takaoka, Masatoshi Yasutake, Takuya Nakaue
Publikováno v:
Japanese Journal of Applied Physics. 48:08JB20
Recently, photomask repairing techniques by scratching fabrication using an atomic force microscopy (AFM) system have been developed. However, the machining method using AFM produces cut debris during photomask repair, which induces problems and erro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fd967a05c20cf936c6c531b9438dca1
https://doi.org/10.1143/jjap.48.08jb20
https://doi.org/10.1143/jjap.48.08jb20