Zobrazeno 1 - 10
of 35
pro vyhledávání: '"Takuya KOMORI"'
Autor:
Emanuel Dutra, Joaquín Muñoz‐Sabater, Souhail Boussetta, Takuya Komori, Shoji Hirahara, Gianpaolo Balsamo
Publikováno v:
Earth and Space Science, Vol 7, Iss 5, Pp n/a-n/a (2020)
Abstract In this study we derive the environmental lapse rate (ELR) from vertical profiles of temperature in the lower troposphere, applying it to downscale air temperature of the new European Centre For Medium‐Range Weather Forecasts (ECMWF) reana
Externí odkaz:
https://doaj.org/article/9201b0155fa5438aa56b06ee9566d8da
Autor:
Shoji HIRAHARA, Yutaro KUBO, Takuma YOSHIDA, Takuya KOMORI, Jotaro CHIBA, Toshinari TAKAKURA, Takafumi KANEHAMA, Ryohei SEKIGUCHI, Kenta OCHI, Hiroyuki SUGIMOTO, Yukimasa ADACHI, Ichiro ISHIKAWA, Yosuke FUJII
Publikováno v:
Journal of the Meteorological Society of Japan. Ser. II. 101:149-169
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d293493cb22762038d3e61cab883d180
https://doi.org/10.2151/jmsj.2023-009
https://doi.org/10.2151/jmsj.2023-009
Publikováno v:
Microelectronic Engineering. 123:54-57
Graphical abstractDisplay Omitted We succeeded in ordering 6-nm-sized dot arrays with 10-nm-pitch between guide lines.The ordering was achieved by graphoepitaxy with self-assemble and the line template.3 to 7-ordered PDMS dot arrays were formed betwe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b9c1ce79b52fda4e9857a051637d9b41
https://doi.org/10.1016/j.mee.2014.05.026
https://doi.org/10.1016/j.mee.2014.05.026
Publikováno v:
Microelectronic Engineering. 121:142-146
The influences of different concentrations of NaCl in tetramethyl ammonium hydroxide (TMAH) developer on the electron beam lithography resolution of hydrogen silsesquioxane (HSQ) resist were studied, using original development model based on the thre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::32c39188992d8847fedd8516e068dd65
https://doi.org/10.1016/j.mee.2014.04.039
https://doi.org/10.1016/j.mee.2014.04.039
Publikováno v:
Key Engineering Materials. 596:83-87
The progress of information technology has increased the demand of the capacity of storage media. Bit patterned media (BPM) has been known as a promising method to achieve the magnetic-data-storage capability of more than 1 Tb/in.2. In this work, we
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f4dfd6f775aa9896f842db72cb898014
https://doi.org/10.4028/www.scientific.net/kem.596.83
https://doi.org/10.4028/www.scientific.net/kem.596.83
Autor:
Takuya Komori, Hui Zhang, Zulfakri bin Mohamad, Sumio Hosaka, Yu Long Zhang, You Yin, Jing Liu
Publikováno v:
Key Engineering Materials. 596:97-100
We calculated thehydrogen silsesquioxane (HSQ) resistprofiles with different contrast developers (γ from 1.9 to 8.1) to reveal the effect of resist contrast on pattern resolution performance. Based on our home-made development modeling, the suitable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c157b9c34f09d272a89b0c60c31e907
https://doi.org/10.4028/www.scientific.net/kem.596.97
https://doi.org/10.4028/www.scientific.net/kem.596.97
Autor:
You Yin, Jing Liu, Sumio Hosaka, Takashi Akahane, Miftakhul Huda, Takuya Komori, Zulfakri bin Mohamad, Muneyasu Masuda
Publikováno v:
Key Engineering Materials. 596:78-82
We investigated the possibility of ordering of 12 nm pitced self-assembled nanodots from block copolymer (BCP) improved by the guide pattern with low line edge roughness (LER) for patterned media. We found that LER of the line pattern (σ-value) was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc047b8c1f78ce8e37dcad403482ad00
https://doi.org/10.4028/www.scientific.net/kem.596.78
https://doi.org/10.4028/www.scientific.net/kem.596.78
Publikováno v:
Key Engineering Materials. 596:73-77
A possibility to fabricate nanodot arrays with a dot size of 2 using self-assembling with PS-PDMS of molecular weight 7000-1500 and EB-drawing for narrow guide lines. These results prove that the fusion method is required for achieving extremely smal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8bba8f649c3f96ee0fc96ecc69aec23f
https://doi.org/10.4028/www.scientific.net/kem.596.73
https://doi.org/10.4028/www.scientific.net/kem.596.73
Autor:
Sumio Hosaka, Takuya Komori, Zulfakri bin Mohamad, Rosalena Irma Alip, Hui Zhang, You Yin, Miftakhul Huda
Publikováno v:
Key Engineering Materials. 596:92-96
In this study, we have fabricated 25-nm-pitched magnetic dot arrays using electron beam lithography (EBL), reactive ion etching (RIE) and ion-milling. We have used double mask method with calixarene resist and carbon film as a hard mask to transfer f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11bc1591d113255fe40c060193568ffa
https://doi.org/10.4028/www.scientific.net/kem.596.92
https://doi.org/10.4028/www.scientific.net/kem.596.92
Autor:
Zulfakri bin Mohamad, Hui Zhang, Sumio Hosaka, Rosalena Irma Alip, You Yin, Takuya Komori, Takashi Akahane, Miftakhul Huda
Publikováno v:
Key Engineering Materials. 534:118-121
CoPt magnetic dot arrays with a fine pitch of 30 nm have been fabricated using electron beam (EB) lithography and ion milling. The possibility to ion-mill CoPt film using EB drawn calixarene resist pattern as a mask has been studied. We formed 30 nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2bf1f12ea3eebecf8fc3d857a8d42d84
https://doi.org/10.4028/www.scientific.net/kem.534.118
https://doi.org/10.4028/www.scientific.net/kem.534.118