Zobrazeno 1 - 10
of 35
pro vyhledávání: '"Takeshi Sunaoshi"'
Autor:
Jiro Usukura, Akihiro Narita, Tomoharu Matsumoto, Eiji Usukura, Takeshi Sunaoshi, Syunya Watanabe, Yusuke Tamba, Yasuhira Nagakubo, Takashi Mizuo, Junzo Azuma, Masako Osumi, Kazutaka Nimura, Ryuichiro Tamochi, Yoichi Ose
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
Abstract The scanning electron microscope (SEM) has been reassembled into a new type of cryo-electron microscope (cryo-TSEM) by installing a new cryo-transfer holder and anti-contamination trap, which allowed simultaneous acquisition of both transmis
Externí odkaz:
https://doaj.org/article/b8e0ce76230b4113a0fa5d7ebebda2c7
Autor:
Jing-jiang Yu, Atsushi Muto, James Kilcrease, Takeshi Sunaoshi, Sadatsugu Nozaki, Alexander Rzhevskii, Sara Chahid, Rajendra Dulal, Serafim Teknowijoyo, Armen Gulian
Publikováno v:
ACS Applied Nano Materials. 6:7629-7636
Autor:
Apurva Mehta, Carlos León, Kedar Manandhar, Jamie L. Weaver, Drew Stasak, Takeshi Sunaoshi, Gus L. W. Hart, Huilong Hou, Suchismita Sarker, Saydul Sardar, Dylan Kirsch, Ichiro Takeuchi, Muye Xiao, Yaoyu Ren, John P. Lemmon
Publikováno v:
ACS Applied Energy Materials. 3:2547-2555
To realize high specific capacity Li-metal batteries, a protection layer for the Li-metal anode is needed. We are carrying out combinatorial screening of Li-alloy thin films as the protection layer...
Autor:
Akihiro Narita, Takeshi Sunaoshi, Yoichi Ose, Yusuke Tamba, Masako Osumi, Ryuichiro Tamochi, Junzo Azuma, Tomoharu Matsumoto, Yasuhira Nagakubo, Syunya Watanabe, Kazutaka Nimura, Jiro Usukura, Takashi Mizuo, Eiji Usukura
Publikováno v:
Scientific Reports
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
The scanning electron microscope (SEM) has been reassembled into a new type of cryo-electron microscope (cryo-TSEM) by installing a new cryo-transfer holder and anti-contamination trap, which allowed simultaneous acquisition of both transmission imag
Autor:
Masako Osumi, Tomoharu Matsumoto, Takashi Mizuo, Junzo Azuma, Takeshi Sunaoshi, Yasuhira Nagakubo, Ryuichiro Tamochi, Akihiro Narita, Syunya Watanabe, Kazutaka Nimura, Yoichi Ose, Eiji Usukura, Jiro Usukura, Yusuke Tamba
A new type of cryo-electron microscopy (cryo-S(T)EM) technique made possible by installing a new cryo-transfer holder and an anti-contamination trap on a scanning electron microscope (Hitachi SU9000) allowed simultaneous collection of both transmissi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef64fc2465a32bdc5e112b3165b32cc0
https://doi.org/10.21203/rs.3.rs-523739/v1
https://doi.org/10.21203/rs.3.rs-523739/v1
Ultra-low landing energy scanning electron microscopy for nanoengineering applications and metrology
Publikováno v:
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII.
A new and exciting imaging technique being applied to thin films, nanocoatings, nanogels, and nanoparticle analysis is ultra-low accelerating voltage or ultra-low-landing-energy scanning electron microscopy (ULVSEM). Instrument conditions in this mod
Autor:
Chihiro Nomaguchi, Jamil J. Clarke, Akinari Morikawa, William Podrazky, Atsushi Muto, Takeshi Sunaoshi
Publikováno v:
Microscopy and Microanalysis. 26:2712-2713
Autor:
Geng Zhong, Qi Dong, Qinqin Xia, Yun Qiao, Jinlong Gao, Xizheng Wang, Liangbing Hu, Takeshi Sunaoshi, Yong Pei, Shaomao Xu, Bao Yang, Mingjin Cui, Glenn Pastel
Publikováno v:
Small (Weinheim an der Bergstrasse, Germany). 15(47)
Carbon-black-supported nanoparticles (CNPs) have attracted considerable attention for their intriguing catalytic properties and promising applications. The traditional liquid synthesis of CNPs commonly involves demanding operation conditions and comp
Publikováno v:
Ultramicroscopy. 209
A new band-pass energy filter (BPF) technique of secondary electron (SE) detection using scanning electron microscope (SEM) was developed to enhance voltage contrast (VC) in SEM images. The energy filtering condition was optimized to enhance VC of do
Autor:
Takeshi Sunaoshi, Mizuno Takayuki, Takashi Kanemura, Junichi Fuse, Akira Kageyama, Yasuhiko Nara
Publikováno v:
2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).
Miniaturization scaling of technology node is advancing in recent years, we are almost facing to the age of mass production for ultra-fine devices with the design rule of one-digit nanometers. Along with the scaling of technology node, distance of ne