Zobrazeno 1 - 10 of 11 pro vyhledávání: '"Takeshi Ohsaki"'
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Three-dimensional nanoimprint lithography using photocurable resins
Autor: Takeshi Ohsaki, Yasuhiro Kamiya, Noriyuki Unno, N. Sakai, Jun Taniguchi
Publikováno v: Plastics, Rubber and Composites. 39:327-331
Three-dimensional nanoimprint lithography was carried out using a photocurable resin. First, a fabricated nanoimprint lithography mould was coated with an antisticking layer. Then, an ultraviolet photocurable resin was dispensed onto cleaned glass sl
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e054ff47b048672bc231a2903a5367a8
https://doi.org/10.1179/174328910x12691245470473
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3
Technique for transfer of high-density, high-aspect-ratio nanoscale patterns in UV nanoimprint lithography and measurement of the release force
Autor: Nobuji Sakai, Yasuhiro Kamiya, Takeshi Ohsaki, Jun Taniguchi
Publikováno v: Microelectronic Engineering. 87:859-863
Ultraviolet nanoimprint lithography (UV-NIL) is a powerful tool for nanoscale fabrication. However, the replication of high-density, high-aspect-ratio mold patterns by UV-NIL is very difficult because of the strong forces required to release the repl
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5ff810cf5b332e7c35cc70a16453cd58
https://doi.org/10.1016/j.mee.2009.12.051
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4
Evaluation of filling behavior on UV nanoimprint lithography using release coating
Autor: Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Ken-ichi Machinaga, Jun Taniguchi
Publikováno v: Microelectronic Engineering. 87:918-921
Ultra violet nanoimprint lithography (UV-NIL), which is able to obtain the nano-scale pattern effectively and quickly, is strongly desired for the next-generation lithography technology. However, it is well known that the higher viscosity UV-curable
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::284346c329fe54dd5ee476d5c3e1e088
https://doi.org/10.1016/j.mee.2009.11.175
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5
Release Properties and Durability of Release Layer on UV Nanoimprint Lithography
Autor: Yasuhiro Kamiya, Nobuji Sakai, Takeshi Ohsaki, Jun Taniguchi
Publikováno v: Journal of Photopolymer Science and Technology. 22:175-180
Two photo-curable resins (PAK-01 and PAK-02) have been evaluated by a primitive test and a precise test. The primitive test is simple manual transfer process and the precise test is using UV nanoimprint lithography (UV-NIL) machine. At first, nano or
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0f815b538e068fd9dbd413eacf32ec70
https://doi.org/10.2494/photopolymer.22.175
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6
Filling Behavior Observation on UV Nanoimprint Lithography
Autor: Ken ichi Machinaga, Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Jun Taniguchi
Publikováno v: Journal of Photopolymer Science and Technology. 22:161-166
Next-generation fine patterning requires a high throughput cost-effective process for the mass producing of various devices, which has a nanometer-scale pattern over a large area. UV nanoimprint lithography (UV-NIL) is a major breakthrough in this fi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::96ef50aa9deddd469cdb9d961e112aa0
https://doi.org/10.2494/photopolymer.22.161
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8
Nucleotide Sequence and Characterization of the Large Mitochondrial rRNA Gene of Penicillium urticae, and Its Comparison with Those of Other Filamentous Fungi1
Autor: Takeshi Ohsaki, Junichi Sekiguchi, Atsushi Naruse, Hiroki Yamamoto
Publikováno v: The Journal of Biochemistry. 117:888-896
The nucleotide sequence of a large rRNA gene and its flanking regions in cloned fragments of mitochondrial DNA from a patulin producer, Penicillium urticae NRRL2159A, was determined by dideoxy sequencing, and the 5' end and intron-exon border of the
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3d9e9cc4debe0617d36bcbaf7ee5130f
https://doi.org/10.1093/oxfordjournals.jbchem.a124792
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9
Characterization and Comparison of Mitochondrial DNAs and rRNAs from Penicillium Urticae and P. Chrysogenum
Autor: Toshio Shida, Takeshi Ohsaki, Junichi Sekiguchi, Hiroki Yamamoto, Kazumichi Koichi
Publikováno v: Journal of General Microbiology. 136:535-543
Mitochondrial DNA (mt DNA) from a patulin producer, Penicillium urticae (synonym P. griseofulvum), was 27.8 kb +/- 0.6 kb in size by electron microscopy and 27.2 kb by agarose gel electrophoresis. Restriction endonuclease maps for nine restriction en
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb694752f93dea2e42464c43ed9727e1
https://doi.org/10.1099/00221287-136-3-535
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10
Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopy
Autor: Takeshi Ohsaki, Makoto Okada, Yohei Sawada, Yoshihiko Hirai, Hiroshi Hiroshima, Yuichi Haruyama, Kazuhiro Kanda, Hiroto Miyake, Shinji Matsui
Publikováno v: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29:06FC05
The formation of bubble defects during UV-nanoimprinting can be prevented by carrying out the process in a 1,1,1,3,3-pentafluoropropane (PFP) gas environment. The authors therefore evaluated the curing time and the calorific value of UV-curable resin
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6dea7962c1ed0f3dc2a3d495ab2e93ae
https://doi.org/10.1116/1.3656022
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