Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Takemasa Miyagi"'
Autor:
Deepak Gupta, Sravan Nandakumar, Takemasa Miyagi, Oliver Jan, Waheb Bishara, Steven Chiou, Kyeong-tae Lee, Andre Kim, Sangdoo Kim, Youngje Um, Ki-il Kim, Changbae Park, Myeonggil Shin, Keun Hee Bai
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::722a7e0e5430f211b7d72ad7318b0704
https://doi.org/10.1117/12.2661320
https://doi.org/10.1117/12.2661320
Autor:
Oksen T. Baris, Akiko Kiyotomi, Junwei Wei, Satoru Shimura, Miyazaki Shinobu, Shigeru Ota, Takemasa Miyagi, Arnaud Dauendorffer, Koji Haneda
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Multi-patterning is one of the commonly used processes to shrink device node dimensions. With the miniaturization of the device node and the increasing number of coated layers and lithography processes, needs for defect reduction and control are gett
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18772c60e297d11ea13bd7ff8ce4f8fa
https://doi.org/10.1117/12.2045737
https://doi.org/10.1117/12.2045737
Autor:
Roel Gronheid, Paulina Rincon Delgadillo, Ryota Harukawa, Paul F. Nealey, Venkat Nagaswami, Chikashi Ito, Takemasa Miyagi, Stephane Durant, Steve R. Lange
Publikováno v:
SPIE Proceedings.
Directed Self-Assembly (DSA) is considered as a potential patterning solution for future generation devices. One of the most critical challenges for translating DSA into high volume manufacturing is to achieve low defect density in the DSA patterning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff6b620097a8040ef4a6fd9c4937c307
https://doi.org/10.1117/12.2046634
https://doi.org/10.1117/12.2046634