Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Takehiro Maehama"'
Publikováno v:
Thin Solid Films. :92-95
Amorphous hydrogenated carbon (a-C:H) film have been deposited by RF magnetron sputtering system in H 2 /He plasma. We investigated the effects of the gas pressure (p t ) to films deposited in a wide region of relative hydrogen gas flow rate. The gro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eaa94e786eff9dcfc85bdeb52454c7db
https://doi.org/10.1016/j.tsf.2005.08.096
https://doi.org/10.1016/j.tsf.2005.08.096
Publikováno v:
Diamond and Related Materials. 15:917-920
Carbon nitride thin films were deposited on Si (100) substrates by DC arc plasma jet CVD. CH 4 + N 2 and graphite + N 2 were used as carbon and nitrogen sources. FT-IR analysis revealed the C–N, C=N, C≡N bonds exist in the deposited films. When t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7dce8e464b507b3e241031af42678734
https://doi.org/10.1016/j.diamond.2005.12.030
https://doi.org/10.1016/j.diamond.2005.12.030
Publikováno v:
Electronics and Communications in Japan (Part II: Electronics). 85:59-65
The absorption process of methylsilanes [SiHx(CH3)4−x(x = 1–3)] onto Si(100) surfaces were investigated by in situ infrared adsorption spectroscopy in the multiple internal reflection geometry. It was established that the exposure of a clean Si(1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d4c72c9ee129f9f80fc97cceb3eadf6e
https://doi.org/10.1002/ecjb.1108
https://doi.org/10.1002/ecjb.1108
Publikováno v:
Applied Surface Science. :161-167
We have investigated in-situ the adsorption and thermal decomposition of methylsilanes, SiH x (CH 3 ) 4− x ( x =1–3), on Si(100)(2×1), using infrared absorption spectroscopy (IRAS) in the multiple internal reflection geometry. IRAS spectra revea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::810fd13479e1afb69634d86182b18708
https://doi.org/10.1016/s0169-4332(00)00186-0
https://doi.org/10.1016/s0169-4332(00)00186-0
Autor:
Kiyoshi Yatsui, Tomihiro Sonegawa, Takehiro Maehama, Katsuhiko Ohtomo, Weihua Jiang, Toshiki Arakaki
Publikováno v:
IEEJ Transactions on Fundamentals and Materials. 120:427-432
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51c34760c96617e312f3a267ec2fe8c9
https://doi.org/10.1541/ieejfms1990.120.4_427
https://doi.org/10.1541/ieejfms1990.120.4_427
Autor:
Ryoichi Ohno, Hiroyuki Toyama, Masaaki Yamazato, Takehiro Maehama, Akira Higa, Minoru Toguchi
Publikováno v:
IEEE Nuclear Science Symposium Conference Record, 2005.
We investigated the effect of plasma treatment on the surface composition of CdTe and the electrical properties of Schottky contact using Al, Ti and In. The composition of the initial CdTe surface is Te-rich due to Br-methanol etching. We propose the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::423232513589154716a7c118f4b1f78e
https://doi.org/10.1109/nssmic.2005.1596580
https://doi.org/10.1109/nssmic.2005.1596580
Autor:
Hiroyuki Toyama, Akira Higa, Takehiro Maehama, Satoru Yamanoha, Masaaki Yamazato, Minoru Toguchi, Ikumi Owan, Ryoichi Ohno
Publikováno v:
2006 IEEE Nuclear Science Symposium Conference Record.
High energy-resolution CdTe radiation detectors with Schottky contact show instability with operating time under bias voltage, which is termed as polarization phenomenon. Time stability is one of the important factors for its practical applications.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ff0d06df12bcd8ced0b63de9a6156ab
https://doi.org/10.1109/nssmic.2006.353795
https://doi.org/10.1109/nssmic.2006.353795
Autor:
Takehiro Maehama, Hiroyuki Toyama, Minoru Toguchi, Masaaki Yamazato, Ryoichi Ohno, Akira Higa
Publikováno v:
Japanese Journal of Applied Physics. 45:8842
Polarization phenomena in a Schottky-type CdTe radiation detector were studied. We evaluated the distribution of electric field in a biased CdTe detector by measuring the progressive change of Schottky barrier lowering with time. The parameters of de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da78f7d352f0710914e843cd7cb20660
https://doi.org/10.1143/jjap.45.8842
https://doi.org/10.1143/jjap.45.8842
Autor:
Minoru Toguchi, Akira Higa, Ryoichi Ohno, Takehiro Maehama, Atsushi Nishihira, Hiroyuki Toyama, Masaaki Yamazato
Publikováno v:
Japanese Journal of Applied Physics. 44:6714
Plasma treatments using various gases have been applied to CdTe(111) surfaces. The induced surface layer composition and morphology were analyzed by X-ray photoelectron spectroscopy and field-emission scanning electron microscopy. He and Ar plasma tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5cc2a55098bf4e785c83a7ce0df5f77
https://doi.org/10.1143/jjap.44.6714
https://doi.org/10.1143/jjap.44.6714
Autor:
Akira Higa, Masaaki Yamazato, Takehiro Maehama, Ryoichi Ohno, Hiroyuki Toyama, Minoru Toguchi
Publikováno v:
Japanese Journal of Applied Physics. 44:6742
We investigated the effect of He plasma treatment on the surface composition of CdTe and the electrical properties of Al/CdTe Schottky contacts. The composition of the initial CdTe surface is Te-rich due to Br-methanol etching. When Al Schottky conta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ad151b86a6035961b4169b070a9e793
https://doi.org/10.1143/jjap.44.6742
https://doi.org/10.1143/jjap.44.6742