Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Takayuki Wakayama"'
Autor:
Takayuki Wakayama, Toshihiro Kogure, Kosho Akatsuka, Kazuko Saruwatari, Masa-aki Haga, Takayoshi Sasaki, Akihiko Yamagishi, Masanori Iitake, Hisako Sato
Publikováno v:
Langmuir. 22:10066-10071
Electrical conductivity of titania nanosheets was investigated for a single-layered Langmuir-Blodgett (LB) film deposited onto a comb-type electrode (5 or 10 microm (electrode spacing) x 8 mm (electrode width)). The photoresponsive electrical propert
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a20ccbf637b79dc85979d901a05c40d
https://doi.org/10.1021/la0621618
https://doi.org/10.1021/la0621618
Autor:
Nozomi Tanifuji, Toshinari Kobayashi, Nobuya Iwata, Syoji Yamada, Yasuaki Matsuda, Takayuki Wakayama
Publikováno v:
Sensors and Actuators A: Physical. 126:159-164
A fabrication process for a silicon (Si)/ceramic hybrid cantilever, proposed for obtaining even homogeneous quality and low cost micro/nano-cantilever products, is described and the preliminary results of using this type of cantilever as a probe in a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e552603164d18f8c8a61964bfccab99
https://doi.org/10.1016/j.sna.2005.05.005
https://doi.org/10.1016/j.sna.2005.05.005
Publikováno v:
Sensors and Actuators A: Physical. 111:26-31
Recently, several researchers have reported fabrications of cantilever based on various GaAs related bulk and heterostructure materials. But the details of fabrication processes and of mechanical properties have not yet been reported so far. In this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a809dd3ee068dd5fb9dff42f30dff72d
https://doi.org/10.1016/j.sna.2003.07.015
https://doi.org/10.1016/j.sna.2003.07.015
Autor:
Shiho Cho, Fumiyoshi Takano, Kohei Ono, Masashi Yamazaki, Tomomi Kanazawa, Hiro Akinaga, Masato Takenaka, Kenichi Masuda, Takayuki Wakayama
Publikováno v:
Applied Surface Science. 254:7918-7920
We propose a reactive ion etching (RIE) process of an L10-FePt film which is expected as one of the promising materials for the perpendicular magnetic recording media. The etching was carried out using an inductively coupled plasma (ICP) RIE system a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d0d5bd16f2ad5101187f49c70323738
https://doi.org/10.1016/j.apsusc.2008.03.155
https://doi.org/10.1016/j.apsusc.2008.03.155
Publikováno v:
Thin Solid Films. 515:8166-8168
A reactive ion etching technique for a semiconducting iron disilicide, β-FeSi 2 , was successfully developed using CH 4 /O 2 /NH 3 /CHF 3 discharge. A CH 4 /O 2 /NH 3 gas which is a sufficient reactant gas for materials including Fe did not etch the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66413d7696968a3c4175c519723eb13c
https://doi.org/10.1016/j.tsf.2007.02.046
https://doi.org/10.1016/j.tsf.2007.02.046
Publikováno v:
Journal of Magnetics. 12:81-83
Etching of NiFe films covered with an organic photo-resist or Ti was successfully performed by an inductively coupled plasma-reactive ion etching (ICP-RIE) system using CHF₃/O₂/NH₃ discharges exchanging CHF3 for CH₄ gas gradually. Experimenta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1216684c114a82e0bd2032ebad2bf2e
https://doi.org/10.4283/jmag.2007.12.2.081
https://doi.org/10.4283/jmag.2007.12.2.081
Publikováno v:
Journal of Magnetism and Magnetic Materials. 310:e745-e747
We have succeeded in accomplishing the highly selective etching of NiFe against Ti masks by an inductively coupled plasma-reactive ion etching technique. This technique utilized CHF3/CH4/O2/NH3. The etching selectivity of Ti against NiFe was remarkab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a3878f45f999d74814cc71e3c38e069
https://doi.org/10.1016/j.jmmm.2006.11.121
https://doi.org/10.1016/j.jmmm.2006.11.121
Publikováno v:
Japanese Journal of Applied Physics. 45:L569-L571
A dry etching technique for a β-FeSi2 film on Si(111) was successfully developed. The technique is reactive ion etching (RIE) with inductively coupled plasma using CH4/O2/NH3/CHF3 discharge at a low pressure. It was found that CHF3 gas is indispensa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7b301f9002a325e375c412793b8822e
https://doi.org/10.1143/jjap.45.l569
https://doi.org/10.1143/jjap.45.l569
Autor:
Yasuaki Matsuda, Nobuya Iwata, Nozomi Tanifuji, Syoji Yamada, Takayuki Wakayama, Toshinari Kobayashi
Publikováno v:
AIP Conference Proceedings.
We present here new cantilevers for scanning probe microscopy (SPM) and sensor applications, which consist of silicon cantilever beam and ceramic pedestal. Silicon is only used to make cantilever beams and tips. Precision‐machinery‐made ceramics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c186b33b1d2a088e9d87a1079ed2cb9a
https://doi.org/10.1063/1.1639705
https://doi.org/10.1063/1.1639705
Publikováno v:
AIP Conference Proceedings.
Recently, several researchers have reported fabrications of cantilever based on various GaAs related bulk and hetrostructure materials. But the details of fabrication processes and of mechanical properties have not yet been reported so far. In this w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a637d933e578261ca5d5f14209d51c4
https://doi.org/10.1063/1.1639711
https://doi.org/10.1063/1.1639711