Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Takayuki Maehara"'
Publikováno v:
Zeitschrift für Naturforschung B. 64:1567-1570
Arylenedioxy-organosilanylene polymers with adamantane units in the backbone were prepared by Rh-catalyzed dehydrocoupling of bis(4-hydroxyphenyl)adamantanes with organohydrosilanes, and their heat resistance was evaluated by thermogravimetric analys
Autor:
Takayuki Maehara, Hiromasa Yamamoto, Junji Takenaka, Tanaka Kenji, Joji Ohshita, Masao Yamaguchi
Publikováno v:
Journal of Applied Polymer Science. 112:496-504
Three adamantane derivatives substituted by epoxy groups, 1,3-bis(glycidyloxy)adamantane (2a), 5,7-dimethyl-1,3-bis(glycidyloxy)adamantane (2b), 1,3,5-tris(glycidyloxy)adamantane (2c), were synthesized from the corresponding adamantanediol or triol i
Publikováno v:
Polymer Journal. 41:973-977
Hydrosilylation Polymerization for the Synthesis of Organosilicon Polymers Containing Adamantane Units
Publikováno v:
Polymer. 48:4301-4304
Palladium-catalyzed dehydrocoupling reactions of 1,3-adamantanediol (Ad(OH) 2 ) with excess amounts of PhMeSiH 2 and PhSiH 3 gave silated products, Ad(OSiPhMeH) 2 and Ad(OSiPhH 2 ) 2 , respectively, in good yield. 1,3,5-Adamantantriol (Ad(OH) 3 ) als
Autor:
Ralph R. Dammel, Takayuki Maehara, Srinivasan Chakrapani, Charito Antonio, Guanyang Lin, Takanori Kudo, Deepa Parthasarathy, Fimiaki Iwasaki, Clement Anyadiegwu, Shenggao Liu, Murirathna Padmanaban, Feederick Lam, Masao Yamaguchi
Publikováno v:
Journal of Photopolymer Science and Technology. 20:719-728
Novel diamantine monomers, 3-methyl-3-diamantyl methacrylate (MDiMA), 3-ethyl-3-diamantyl methacrylate (EDiMA), and 9-hydroxy-4-diamantyl methacrylate (HDiMA) were synthesized starting from diamantane. Free radical polymerizations of these monomers a
Autor:
Shenggao Liu, Guanyang Lin, Clement Anyadiegwu, Charito Antonio, Ralph R. Dammel, Frederick W. Lam, Masao Yamagchi, Munirathna Padmanaban, Srinivasan Chakrapani, Takayuki Maehara, Anthony Waitz, Takanori Kudo, Dalil Rahman, Deepa Parthasarathy
Publikováno v:
SPIE Proceedings.
The dominant current 193 nm photoresist platform is based on adamantane derivatives. This paper reports on the use of derivatives of diamantane, the next higher homolog of adamantane, in the diamondoid series, as monomers in photoresists. Due to thei