Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Takayuki Iwamatsu"'
Autor:
Takayuki Iwamatsu, Hiromoto Uwe
Publikováno v:
Journal of the Physical Society of Japan. 62:1017-1024
Superconductivity and the normal-state uniform magnetic susceptibility for Bi 2 Sr z Ca 3- z Cu 2 O y ( z =1–2) have been studied. T c and the oxygen content y stay nearly constant with z , while the magnetic property exhibits a remarkable variatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b12bbb10d00b9d3179cbb01290dc386
https://doi.org/10.1143/jpsj.62.1017
https://doi.org/10.1143/jpsj.62.1017
Autor:
Koji Hiruta, Kazuhide Yamashiro, Mutsumi Hara, Tatsuya Fujisawa, Hiroaki Morimoto, Takayuki Iwamatsu, Yoichi Takehana, Takaei Sasaki, Yasushi Okubo, Noriyuki Harashima
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49336c7cbea583ca75b51f166e45c2bf
https://doi.org/10.1117/12.410736
https://doi.org/10.1117/12.410736
Autor:
Yasushi Okubo, Yoichi Takehana, Takayuki Iwamatsu, Tatsuya Fujisawa, Kazuhide Yamashiro, Koji Hiruta, Hiroaki Morimoto, Takaei Sasaki, Mutsumi Hara, Noriyuki Harashima
Publikováno v:
SPIE Proceedings.
The dry etching process by using NLD (Neutral Loop Discharge Plasma) has been evaluated. The loading effect was measured applying the CAR (Chemically Amplified Resist) negative resist process in the low pressure etching condition, where an excellent
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18848a7455d8c8b3515e1dec56487e8c
https://doi.org/10.1117/12.392060
https://doi.org/10.1117/12.392060
Autor:
Takayuki Iwamatsu, Tatsuya Fujisawa, Shinji Kubo, Kouji Hiruta, Masao Sugiyama, Hiroaki Morimoto
Publikováno v:
SPIE Proceedings.
As the LSI pattern density increases, the minimum feature size on reticle decreases and the required dimensional accuracy becomes more severe. To write patterns for 130nm- node device, the proximity effect correction is essential for electron beam ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8730cd5c0845707341d1e061b9abc40e
https://doi.org/10.1117/12.392056
https://doi.org/10.1117/12.392056
Autor:
Hiroaki Morimoto, Tatsuya Fujisawa, Shinji Kubo, Takayuki Iwamatsu, Masao Sugiyama, Koji Hiruta
Publikováno v:
SPIE Proceedings.
For the next generation reticle fabrication, one of the key technologies is a high accelerating voltage EB writing system in combination with CAR (Chemically Amplified Resist) process. So we have evaluated an advanced electron beam mask-writing syste
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4769d5a058f653542d0ba599491387dd
https://doi.org/10.1117/12.373292
https://doi.org/10.1117/12.373292
Autor:
Tatsuya Fujisawa, Koji Hiruta, Shinji Kubo, Masao Sugiyama, Hiroaki Morimoto, Takayuki Iwamatsu
Publikováno v:
SPIE Proceedings.
This work demonstrated the ability of 230 mm reticle manufacture by a current technology. The CD accuracy of 17 nm (3 (sigma) ) and image placement accuracy of 30 nm (3 (sigma) ) were obtained in the 230 mm reticle. It was able to be confirmed that t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f474f4c325581f0d6532eb17697b220
https://doi.org/10.1117/12.373294
https://doi.org/10.1117/12.373294
Autor:
Shinji Kubo, Koji Hiruta, Masao Sugiyama, Takayuki Iwamatsu, Tatsuya Fujisawa, Hiroaki Morimoto
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3755d40ed6f6cd7cdab423fb71ea516
https://doi.org/10.1117/12.360221
https://doi.org/10.1117/12.360221
Autor:
Tatsuya Fujisawa, Hiroaki Morimoto, Takayuki Iwamatsu, Takaei Sasaki, Kouji Hiruta, Kazuhide Yamashiro
Publikováno v:
SPIE Proceedings.
An advanced photomask dry etching system (NLDE-9035 Prototype) has been evaluated. This system adopts new plasma source NLDE, and has a 230 mm mask capability. In this experiment, etching uniformity, selectivity and etching pattern profile were mainl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::580a4df8f5f45743512651d055a9107c
https://doi.org/10.1117/12.360255
https://doi.org/10.1117/12.360255
Publikováno v:
SPIE Proceedings.
We evaluated an advanced CD-SEM as a photomask CD guarantee tool. Measurement repeatability was 2.3 nm (3 (sigma) ) for each measurement, and reproducibility (the range of average value in 5 days) is 3 nm. Contamination effect was evaluated by measur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9b39511cf6046994c34d379d21afba6
https://doi.org/10.1117/12.332868
https://doi.org/10.1117/12.332868
Publikováno v:
SPIE Proceedings.
The effect of phase shift and transmittance fluctuation in a mask plate have been studied. The differences of these optical properties of halftone phase shift masks result in critical dimension(CD) error on a wafer so that these fluctuation in a plat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a9b2134e6150ff23ec2ab3906093572
https://doi.org/10.1117/12.245248
https://doi.org/10.1117/12.245248