Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Takayoshi Niiyama"'
Autor:
Takayoshi Niiyama, Akira Kawai
Publikováno v:
Japanese Journal of Applied Physics. 45:5383-5387
In the advanced lithography process, the immersion lithography technique has become important in order to achieve the high quality resist patterns less than 50nm. In this technique, some defects such as a watermark and a nanoscale bubble have been fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d9ccfd2e75407c0a3b2c1d259ae9730d
https://doi.org/10.1143/jjap.45.5383
https://doi.org/10.1143/jjap.45.5383
Autor:
Daisuke Maruyama, Akira Kawai, Takayoshi Niiyama, Takashi Matsumoto, Takahiro Kishioka, Yasushi Sakaida, Takahiro Moriuchi
Publikováno v:
Microelectronic Engineering. 83:659-662
The improvement of adhesion property of microresist pattern has been recognized as one important problem that needs to be solved in the nanoscale-device fabrication. As decreasing wavelength of the exposure source for miniaturizing the resist pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16e9d06a746a9f179bb4fa49012647f4
https://doi.org/10.1016/j.mee.2005.12.030
https://doi.org/10.1016/j.mee.2005.12.030
Autor:
Takayoshi Niiyama, Akira Kawai
Publikováno v:
Journal of Photopolymer Science and Technology. 18:373-380
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f1f115e9564e352bb207737a9296b0
https://doi.org/10.2494/photopolymer.18.373
https://doi.org/10.2494/photopolymer.18.373
Autor:
Akira Kawai, Takayoshi Niiyama
Publikováno v:
Journal of Photopolymer Science and Technology. 17:453-456
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3752b05bc75d43a768e5573febd13da
https://doi.org/10.2494/photopolymer.17.453
https://doi.org/10.2494/photopolymer.17.453
Publikováno v:
Journal of Photopolymer Science and Technology. 17:461-464
In the resist pattern development process, the drying behavior of the rinse water affects strongly to pattern fabrication properties such as pattern collapse, bubble capture, micro defect adhesion and so on. In order to analyze the drying speed depen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f836f156c31cfdb6d85d0e992faacf30
https://doi.org/10.2494/photopolymer.17.461
https://doi.org/10.2494/photopolymer.17.461
Autor:
Masakazu Sanada, Akira Kawai, Tomohiro Goto, Osamu Tamada, Takayoshi Niiyama, Takahiro Moriuchi
Publikováno v:
SPIE Proceedings.
Recently, pattern collapse is becoming one of the critical issues in semiconductor manufacturing and many works have been done to solve this issue 1 ) 2 ). Since pattern collapse occurs when outer force onto the resist pattern such as surface tension
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f36137a80f94d25ef8da2a9b8e33402
https://doi.org/10.1117/12.651999
https://doi.org/10.1117/12.651999
Autor:
Masakazu Sanada, Masahiko Harumoto, Akira Kawai, Osamu Tamada, Shimpei Hori, Takayoshi Niiyama
Publikováno v:
SPIE Proceedings.
In immersion lithography technique, some defects such as a watermark and a nanoscale bubble have been focused as the serious problems to be solved. In order to clarify the formation mechanism of the watermark, the in-situ observation of the drying be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d958fdc48840f3aec5f05d76123f14fc
https://doi.org/10.1117/12.655420
https://doi.org/10.1117/12.655420
Autor:
Hotaka Endo, Osamu Tamada, Akira Kawai, Masakazu Sanada, Atsushi Ishikawa, Kenta Suzuki, Takayoshi Niiyama, Masaki Yamanaka
Publikováno v:
SPIE Proceedings.
It is necessary to develop a nano-bubble detector similar as a conventional particle counter for reducing micro and nano defects caused by nano-bubble (NB) in immersion lithography. In this regard, we discuss adhesion and removal mechanisms of NB adh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a29bfe25f64ae7db94a96bf829654f5
https://doi.org/10.1117/12.655444
https://doi.org/10.1117/12.655444
Autor:
Akira Kawai, Tomotaka Ariga, Simpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada, Takayoshi Niiyama
Publikováno v:
SPIE Proceedings.
The micro bubbles condense in the concave channel and are trapped at the channel corner. In the experiments, the deionized (DI) water is dropped on a dry film resist (DFR) pattern. In the result, the micro bubble condensed and trapped at the differen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0db96b0600013272ab7aeb678cbb1700
https://doi.org/10.1117/12.655447
https://doi.org/10.1117/12.655447
Publikováno v:
SPIE Proceedings.
Mechanical strength of resist film processed by various post apply bake (PAB) conditions were measured utilizing the tip indentation method using atomic force microscope (AFM). With the tip indentation method, we could quantify mechanical strength of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::889b7484af1d848eab2cf3ef2d120e17
https://doi.org/10.1117/12.599195
https://doi.org/10.1117/12.599195