Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Takayoshi Abe"'
Publikováno v:
Synthesis. :0213-0216
Synthesis of new long-chained hypervalent iodine-benzyne precursors, (4-dodecylphenyl) ‖2- (trimethylsilyl) phenyl‖iodonium triflate and the tetradecyl derivative, is described. The benzyne precursors dissolve even in organic solvents of low pola
Autor:
Takayoshi Abe, Hiroyuki Moriyoshi, Hideki Nakayama, Koji Itohara, Shin-ichi Nakaki, Toshio Morikawa
Publikováno v:
Japanese journal of science and technology for identification. 3:57-62
Publikováno v:
The Proceedings of the 1st International Conference on Industrial Application Engineering 2013.
The logic simulation cannot verify the video processing hardware completely. Therefore, the prototyping on an FPGA is performed. However, the effort to develop the interfaces for a camera, an image memory, and a host PC is a large load for developers
Publikováno v:
Proceedings of the 1st IEEE/IIAE International Conference on Intelligent Systems and Image Processing 2013.
In recent years, the touchscreen is adopted as various electronic devices. However, on a flat touchscreen, for a vision disabled person, tactile feeling with the finger which is important information may not be obtained. Therefore operativity may be
Publikováno v:
Proceedings of the 1st IEEE/IIAE International Conference on Intelligent Systems and Image Processing 2013.
With the sophistication of embedded devices, it has become necessary hardware of various processes. Also, of the design flow for performing hardware implementation, design flow using high level synthesis has attracted attention. n this design flow, l
Autor:
Yoshikazu Yamaguchi, Yuusuke Anno, Tsutomu Shimokawa, Takayoshi Abe, Makoto Sugiura, Masafumi Hori, Tomohiro Kakizawa, Tomoki Nagai, Atsushi Nakamura, Shiro Kusumoto, Gouji Wakamatsu
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Double patterning based on existing ArF lithography technology is one of the most promising candidates for sub-40nm half-pitch devices. Several variation of double patterning processes have been reported by research groups, including a dual-trench pr
Autor:
Tooru Kimura, Motoyuki Shima, Takashi Chiba, Tsutomu Shimokawa, Shiro Kusumoto, Takayoshi Abe
Publikováno v:
SPIE Proceedings.
Contact hole shrink process is becoming more important option for 45nm node design rules. In general, lithography of contact hole has been harder than that of line and space application due to the low contrast of incident light. The contact hole size