Fas Ligand Induces Cell-Autonomous IL-23 Production in Dendritic Cells, a Mechanism for Fas Ligand-Induced IL-17 Production

Autor: Takashi Suda, Ryu Imamura, Hiroyasu Kidoya, Ayano Yahagi, Goro Matsuzaki, Takaya Kawabe, Masayuki Umemura

Publikováno v: The Journal of Immunology. 175:8024-8031

Fas ligand (FasL) has the potential to induce inflammation accompanied by massive neutrophil infiltration. We previously reported that FasL rapidly induces the production of various inflammatory cytokines including IL-1β and IL-17. In this study, we

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16ae6855a57adde4dbbbc670bb751008
https://doi.org/10.4049/jimmunol.175.12.8024

Electron-Stimulated Surface Stress Relaxation of Si

Autor: Tetsuya Narushima, Masahiro Kitajima, Akiko N. Itakura, Takaya Kawabe

Publikováno v: Hyomen Kagaku. 22:614-619

We have observed for the first time non-thermal relaxation of the surface stress of Si induced by electron irradiation at room temperature. An atomically thin disordered layer was introduced by Ar ion bombardment. The surface stress change during the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0a3ed6a775811f2980de292bda3b813c
https://doi.org/10.1380/jsssj.22.614

[Untitled]

Autor: Satoshi KUROKOUCHI, Masayuki OKABE, Mitsuyoshi SAITO, Shinsaku MORITA, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Seiichiro KANNO, Tatehito USUI, Koichi SUDOH, Tatsuo YOSHINOBU, Hiroshi IWASAKI, Hiroaki TANAKA, Kimio OKUNO, Tadao MIURA, Touru SUMIYA, Katsuya HONDA, Shun-ichiro TANAKA, Yukio INOKUTI, Kazuhiro SUZUKI, Nastuki TAKAHASHI, Osamu OHKUBO, Yoshihiro SAWAHIRA, Akishige SATO, Naoto KIKUCHI, Eiji KUSANO, Hidehito NANTO, Akira KINBARA, Tetsuya NARUSHIMA, Akiko ITAKURA, Takaya KAWABE, Masahiro KITAJIMA, Masaru KITAGAWA, Toshiyuki OHYA, Hiroyuki NAGAHAMA, Sei-ichiroh YOKOYAMA, Ichiro ARAKAWA, Takashi ADACHI, Takato HIRAYAMA, Koichiro MITSUKE, Makoto SAKURAI, Sin-ichi IGARASHI, Yukiko ABE, Yasuo IRIE, Miyuki KAMBE, Aki TOSAKA, Satoko HAMAMATSU, Satoshi ISHII, Yoshiyuki NORIMITSU, Toshimi SUTOU, Noriyuki UBUKATA, Yoshihiro OINUMA, Shigeru SAITO, Masaaki KATOH, Kenichi TAJIMA, Daisuke HORIMOTO, Takeo OHTE, Akira KOJIMA, Seiya OHI, Takashi SHIOYA, Kazuhiko KOBAYASHI, Hidefumi NAKAJIMA, Satoshi YOKOYAMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Koichiro UCHIMURA, Hitoshi TABATA, Tomoji KAWAI, Yutaka HIBINO, Guochun XU, Yasuo SUZUKI, Masao TANIHARA, Yukio IMANISHI, Shigemi SUGINUMA, Masahiro HIRATA, Hitoshi AKIMICHI, Kyoko TAKEUCHI, Yutaka TUZI, Masahiro TOSA, Akira KASAHARA, Kyung Sub LEE, Kazuhiro YOSHIHARA, Tomonari TANAKA, Tadashi SAWADA, Wataru SUGIYAMA, Koyu OTA, Daisuke YAMAUCHI, Shinobu SATO, Masatoshi TANAKA, Masaaki KISHIDA, Masahiko TOMITORI, Kiyotaka ASAKURA, Wang-Jae CHUN, Yasuhiro IWASAWA, Kiminori KAKITANI, Hiroko KAJI, Yoichiro YAGI, Akio YOSHIMORI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Shigeaki NAKAMURA, Nobuo SAITO, Shoji YOSHIOKA, Isamu NAKAAKI, Hideo HASEGAWA, Toshiyuki MIHARA, Shoichi MOCHIZUKI, Shigeharu TAMURA, Hironori KOBAYASHI, Ryoji MAKABE, Tadashi ISHIDA, Yoshiyuki SATO, Masanori ANDO, Tetsuhiko KOBAYASHI, Ayako HIOKI, Kazuki NATSUKAWA, Koji INOUE, Yoshikazu NAKAYAMA, Takayuki SATO, Shinichiro MICHIZONO, Yoshio SAITO, Shinichi KOBAYASHI, Kiyohide KOKUBUN, Yuuki WATANABE, Heizo TOKUTAKA, Kikuo FUJIMURA, Tatsuo SHIMIZU, Yasushiro NISHIOKA, Hideki TANAKA, Hiroyuki WAKIMOTO, Toshihiko MIYAZAKI, Goro MIZUTANI, Sukekatsu USHIODA, Yoshitake YAMAGUCHI, Satoru TAKAKUSAGI, Makoto KATO, Yuji SAKAI, Akira KUROKAWA, Shingo ICHIMURA, Ken NAKAMURA, Takanori AOKI, Syogo TODA, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Kazuaki HAMAJI, Yoshiharu KAKEHI, Tsutom YOTSUYA, Norihiro MATSUOKA, Yoshitsugu TSUTSUMI, Hideki TOMIOKA, Yoshio OKAMOTO, Kensuke MURAI, Masato YASUMOTO, Norimasa UMESAKI, Hirohiko NAKANO, Toshiaki TATSUTA, Jiro MATSUO, Isao YAMADA, Hiroyuki MAGARA, Osamu TABATA, Touichi HATANO, Masatoshi KOTERA, Kiyoshi YAMAGUCHI, Naohiro HORII, Kunio OKIMURA, Akira SHIBATA, Hiroshi MURAKAMI, Ikuya KAMEYAMA, Satoru SUKENOBU, Kazuhiko MIMOTO, Takashi MATSUMOTO, Takafumi YOSHIKAWA, Masato KIUCHI, Seiichi GOTO, Masatoshi OHBA, Yoshiaki AGAWA, Kazuma SHIBUTANI, Hiroshi TSUJI, Yasuhito GOTOH, Junzo ISHIKAWA, Hiroki KAWADA, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masanori KATSUYAMA, Shinichi SUZUKI, Katsuto TANAHASHI, Yuichi KAWAMURA, Naohisa INOUE, Yoshikazu HOMMA, Michimasa KIKUCHI, Kazumasa ISHIKAWA, Teiichi HOMMA, Yoshinori SUGANUMA, Nan LI, Katsuyoshi KOBAYASHI, Nobuyoshi SAKAKIBARA, Yoshiki UENO, Masayuki AOKI, Toshiaki YASUI, Keito MORIMOTO, Hirokazu TAHARA, Takao YOSHIKAWA, Hidekazu KODERA, Masahiko UOTA, Yoshihiro SATOH, Tomio KUBO, Kozo MOCHIJI, Naoshi ITABASHI, Hiroshi SHIMIZU, Shunsuke OHTANI, Kazuhiko OKUNO, Nobuo KOBAYASHI

Publikováno v: SHINKU. 42:417-495

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e06a27fd4675b04c3a233a96939266ab
https://doi.org/10.3131/jvsj.42.417

Initial plasma oxidation kinetics of silicon: DC bias effects

Autor: M. Kitajima, Kazutaka G. Nakamura, Takaya Kawabe, I. Kamioka

Publikováno v: Thin Solid Films. :98-101

The effects of applied bias on initial plasma oxidation of silicon was studied using real-time ellipsometry and Langmuir probe measurements. In the ultra-thin oxide regime, the plasma oxidation is enhanced by both positive bias and negative bias. The

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::eb4e82f8940b1d2dc755291b05728f23
https://doi.org/10.1016/0040-6090(96)08584-7

Effect of Oxygen Ions on Plasma Oxidation of Silicon

Autor: Kazutaka G. Nakamura, Masahiro Kitajima, Takaya Kawabe, I. Kamioka, Shunichi Hishita

Publikováno v: Hyomen Kagaku. 16:504-509

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d626b0d19f8b3d576f4611f826e3ef5c
https://doi.org/10.1380/jsssj.16.504