Výsledky vyhledávání - "Takashige Fujimori"

Ablation of silica glass induced by laser plasma soft X-ray irradiation

Autor: Takashige Fujimori, Hiroyuki Niino, Shuichi Torii, Tetsuya Makimura, Kouichi Murakami

Publikováno v: Electronics and Communications in Japan. 94:30-35

Silica glass can be ablated using focused laser plasma soft X-rays. The ablation technique enables us to fabricate trenches with a width as narrow as 50 nm. In the present paper, we have investigated the nano-ablation process. The soft X-ray irradiat

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::06466d293ae559c2ec727a5c24d75efa
https://doi.org/10.1002/ecj.10354

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Ablation Process of Silica Glass Induced by Laser Plasma Soft X-ray Irradiation

Autor: Tetsuya Makimura, Hiroyuki Niino, Shuichi Torii, Kouichi Murakami, Takashige Fujimori

Publikováno v: IEEJ Transactions on Electronics, Information and Systems. 129:595-600

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2dd0d9d2615e9e995c6f2146a7f122d2
https://doi.org/10.1541/ieejeiss.129.595

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Study on Non-Thermal Ablation Process of Silica Glass Using Laser Plasma Soft X-rays toward Nanomachining

Autor: Hiroyuki Niino, Shuichi Torii, Kouichi Murakami, Takashige Fujimori, Tetsuya Makimura

Publikováno v: IEEJ Transactions on Electronics, Information and Systems. 129:1186-1191

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9bce57da1f1d059cda89cad40aca4563
https://doi.org/10.1541/ieejeiss.129.1186

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Micromachining of inorganic materials using plasma soft x-rays

Autor: Takashige Fujimori, Kouichi Murakami, Hiroyuki Niino, Satoshi Uchida, Tetsuya Makimura

Publikováno v: Electronics and Communications in Japan. 91:45-51

We have investigated nanomachining of inorganic materials using laser plasma soft X-rays. The soft X-rays were generated by irradiating Ta targets with pulsed Nd:YAG laser light. The laser plasma soft X-rays were focused using an ellipsoidal mirror,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4bcea74cc02e20d128e4bdd9a69c43a8
https://doi.org/10.1002/ecj.10080

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Micromachining of Inorganic Materials using Laser Plasma Soft X-Rays

Autor: Hiroyuki Niino, Takashige Fujimori, Tetsuya Makimura, Kouichi Murakami, Satoshi Uchida

Publikováno v: IEEJ Transactions on Electronics, Information and Systems. 127:179-184

We have investigated nanomachining of inorganic materials using laser plasma soft X-rays. The soft X-ray was generated by irradiating Ta targets with pulsed Nd:YAG laser light. The laser plasma soft X-rays were focused using an ellipsoidal mirror, wh

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1bf99da5c6f64e92b006740b4232f597
https://doi.org/10.1541/ieejeiss.127.179

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Nano-Ablation of Inorganic Materials Using Laser Plasma Soft X-rays at around 10 nm

Autor: Tetsuya Makimura, Hisao Miyamoto, Satoshi Uchida, Takashige Fujimori, Hiroyuki Niino, Kouichi Murakami

Publikováno v: Japanese Journal of Applied Physics. 45:5545-5547

We have investigated direct nanomachining of inorganic materials using laser plasma soft X-rays. Soft X-rays (X) were generated by irradiation of Ta targets (Ta) with 532 nm Nd:YAG laser light(Y) with a pulse duration of 7 ns, at an energy density of

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c4933d3754e0084b38cb2e95b06ec522
https://doi.org/10.1143/jjap.45.5545

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Ablation of inorganic materials using laser plasma soft X-rays

Autor: Hiroyuki Niino, Takashige Fujimori, Satoshi Uchida, Kouichi Murakami, Tetsuya Makimura

Publikováno v: SPIE Proceedings.

We have investigated ablation of inorganic materials using pulsed and focused soft X-rays. Soft X-rays in a range of 1-500 eV were produced by irradiation of Ta targets with Q-switched Nd:YAG laser light (532 nm, 0.5-0.8 J/pulse) with a pulse duratio

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b8adf081bf114d95e141e37474082bc6
https://doi.org/10.1117/12.723799

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Highly reliable oxide-semiconductor TFT for AMOLED displays

Autor: Eri Fukumoto, Narihiro Morosawa, Kazuhiko Tokunaga, Takashige Fujimori, Tatsuya Sasaoka, Toshiaki Arai, Yasuhiro Terai

Publikováno v: Journal of the Society for Information Display. 19:205

— The stability and reliability of oxide-semiconductor TFTs were investigated. The contact material to the oxide semiconductor affected the thermal stability of the TFT, and a molybdenum-contact source/drain showed good stability. And the passivati

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::669746e43edc9ad259b3e99a4d48a49a
https://doi.org/10.1889/jsid19.2.205

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