Zobrazeno 1 - 10
of 146
pro vyhledávání: '"Takashi, Ichii"'
Autor:
Yuya Yamada, Takashi Ichii, Toru Utsunomiya, Kuniko Kimura, Kei Kobayashi, Hirofumi Yamada, Hiroyuki Sugimura
Publikováno v:
Nanoscale Advances. 5(3):840-850
The detection of vertical and lateral forces at the nanoscale by atomic force microscopy (AFM) reveals various mechanical properties on surfaces. The qPlus sensor is a widely used force sensor, which is built from a quartz tuning fork (QTF) and a sha
Publikováno v:
ACS Applied Nano Materials. 5:11707-11714
Autor:
Takashi ICHII
Publikováno v:
Journal of The Surface Finishing Society of Japan. 73:359-363
Publikováno v:
The Journal of Physical Chemistry C. 125:26201-26207
Publikováno v:
Langmuir. 37:9920-9926
Chemical etching of silicon assisted by various types of carbon materials is drawing much attention for the fabrication of silicon micro/nanostructures. We developed a method of chemical etching of silicon that utilizes graphene oxide (GO) sheets to
Publikováno v:
Japanese Journal of Applied Physics. 61
Electrochemical exfoliation of graphite is a method for synthesizing graphene oxide (GO) with fewer structural defects than GO synthesized by conventional chemical oxidation. Photoreduction of GO has been focused on due to their facile procedures, an
Publikováno v:
Journal of The Surface Finishing Society of Japan. 72:704-706
Publikováno v:
Langmuir. 36:10933-10940
Microcontact printing (μCP) techniques have sparked a surge of interests in microfabrication since they help produce arrays on a wide range of target substrates in a facile and efficient manner. Polydimethylsiloxane (PDMS), as a well-established mat
Publikováno v:
Japanese Journal of Applied Physics. 62:SG1040
Chemical etching of semiconductor surfaces assisted by various types of carbon-based materials is drawing much attention for the fabrication of those micro-nano structures. We herein demonstrated to apply graphene oxide (GO), a 2D nano-carbon materia
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 37(47)
In this report, micropatterns of (3-aminopropyl)trimethoxysilane (APTMS) were developed on hydrophilic and hydrophobic surfaces after patterning using 172 nm vacuum ultraviolet (VUV) photolithography. Self-assembled monolayers (SAMs) formed on Si sub