Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Takahisa Doi"'
Autor:
Takahisa Doi, M. Koguchi
Publikováno v:
Surface Science. 653:226-236
The topography of a Si(001) vicinal surface is investigated using reflection electron microscopy (REM) during alternating current (AC) heating of the surface in ultra-high vacuum. The normal direction of the surface is slightly tilted from the [001]
Publikováno v:
Surface Science. 499:161-173
The topography of a Si(0 0 1) vicinal surface is investigated by using reflection electron microscopy after alternating current (AC) heating at temperatures up to about 1140 °C. At temperatures below 850 °C, AC heating produces 1×2 surfaces that c
Publikováno v:
Surface Science. 426:1-7
The structure of Si layers deposited on a Si(001) 2×1 surface at room temperature is investigated by reflection electron microscopy. After the sample heating by direct current, the structure of the deposited layer returns to the 2×1 surface at cove
Publikováno v:
Surface Science. 376:87-91
A clean Si(111) surface has been investigated by scanning reflection electron microscopy (REM) with an electron beam incident at grazing angles onto the surface. The signal of the absorbed current into the sample (the absorption current image) is use
Publikováno v:
Surface Science. :868-872
The diffusion of Si adsorbates deposited on a Si(001) clean surface is investigated by using a reflection electron microscope (REM). When the sample is heated by radiative heating and/or direct current heating, the denuded zones are created at the te
Publikováno v:
Surface Science. 351:135-140
When a Si(001) sample was heated to temperatures above 1500 K by passing a direct current through it, we observed the migration of a Si microcluster on the Si(001) surface by using an electron microscope. This microcluster migrates toward the anode s
Publikováno v:
Surface Science. 343:24-30
The diffusion of Si adsorbates deposited on a Si(001) surface is studied by a reflection electron microscope (REM). The diffusion constants are obtained from the diffused lengths of the Si adsorbates. The activation energy of diffusion is determined
Autor:
Takahisa Doi, Akitoshi Ishizaka
Publikováno v:
Philosophical Magazine Letters. 65:95-100
The temperature dependence of Si(111) surface structures has been studied. Reflection electron diffraction intensities have been measured for Si(111) clean surfaces as a function of temperature. Diffraction intensities change at 830,1110 and 1410 K,
Publikováno v:
Applied Physics Letters. 74:3675-3677
Molecular beam epitaxy (MBE) of Si atoms onto a Si(001) 1×2 surface is investigated using reflection electron microscopy. A 1×2 surface with wide 1×2 and narrow 2×1 terraces is prepared by passing a direct current from the down side to the up sid
Publikováno v:
MRS Proceedings. 1026
The spatial distribution of flux pinning centers in YBa2Cu3O7 (YBCO) coated conductors significantly affects the conductive properties. Nanoparticles acting as pinning centers can be intentionally introduced into the structure by chemical doping. In