Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Takahiro Goya"'
Publikováno v:
Japanese Journal of Applied Physics. 62:SI1010
To investigate the electrical properties and degradation features of dielectric materials during plasma exposure, we developed an in situ impedance spectroscopy (IS) system. We applied the proposed system to monitor SiO2/Si structures exposed to Ar p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfdf18e2592f4ca128c20b89bb26e903
https://doi.org/10.35848/1347-4065/acc7ae
https://doi.org/10.35848/1347-4065/acc7ae
Publikováno v:
Journal of Physics D: Applied Physics; 11/29/2024, Vol. 57 Issue 47, p1-12, 12p