Zobrazeno 1 - 10
of 65
pro vyhledávání: '"Takahiro, Kitano"'
Publikováno v:
The Journal of Headache and Pain, Vol 25, Iss 1, Pp 1-13 (2024)
Abstract Background Clinical characteristics and treatment practice of patients with migraine in Japan in real-world setting have not been fully investigated. We conducted a retrospective cohort study using claims database to understand the clinical
Externí odkaz:
https://doaj.org/article/89da59081f1c4026bda12b1e8cd48324
Autor:
Kanzo Kato, Lior Huli, Nathan Antonovich, David Hetzer, Steven Grzeskowiak, Eric Liu, Akiteru Ko, Satoru Shimura, Shinichiro Kawakami, Takahiro Kitano, Seiji Nagahara, Luciana Meli, Indira Seshadri, Martin Burkhardt, Karen Petrillo
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62f26d28be561703578290b2c86ae190
https://doi.org/10.1117/12.2657290
https://doi.org/10.1117/12.2657290
Autor:
Makoto Muramatsu, Takanori Nishi, Kiyohito Ito, Yoshihito Takahashi, Yasunori Hatamura, Takahiro Kitano, Tomohiro Iwaki
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1af227f0f129d5f7c2cf2c429b8fd24
https://doi.org/10.1117/12.2658245
https://doi.org/10.1117/12.2658245
Autor:
Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, Akihiro Sonoda
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a28a45c5dd27e45f08ae7af37c1ea4b4
https://doi.org/10.1117/12.2642878
https://doi.org/10.1117/12.2642878
Autor:
Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, Alex Hubbard
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64495d07f491b080d950ef1d71c013f4
https://doi.org/10.1117/12.2613805
https://doi.org/10.1117/12.2613805
Autor:
Dave Hetzer, Alexandra Krawicz, Luciana Meli, Alex Hubbard, Cody Murray, Christopher Cole, Shinichiro Kawakami, Karen Petrillo, Soichiro Okada, Akihiro Sonoda, Kanzo Kato, Lior Huli, Naoki Shibata, Satoru Shimura, Takahiro Kitano, Angelique Raley
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
As the industry continues to push the limits of integrated circuit fabrication, reliance on EUV lithography has increased. Additionally, it has become clear that new techniques and methods are needed to mitigate pattern defectivity and roughness at L
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5a67765648aab4b0a480a914b3fc6ed
https://doi.org/10.1117/12.2602829
https://doi.org/10.1117/12.2602829
Publikováno v:
Novel Patterning Technologies 2021.
Direct Self-Assembly (DSA) is expected to be applied to patterns below 20 nm, and many applications have been proposed along with several lithography techniques. The advantage of DSA is that the molecular weight of the polymer can control the pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f51d222e60430f88f592dfbb340f818
https://doi.org/10.1117/12.2584946
https://doi.org/10.1117/12.2584946
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Directed self-assembly (DSA) is one of the candidates for next generation lithography. Over the past years, many papers and presentation have been reported regarding DSA, and Tokyo Electron Limited (TEL is a registered trademark or a trademark of Tok
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d34a439b1eb219224fcb29d3d5e1c075
https://doi.org/10.1117/12.2583668
https://doi.org/10.1117/12.2583668
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Directed self-assembly (DSA) is one of the candidates for next generation lithography. Over the past years, many papers and presentation have been reported regarding DSA, and Tokyo Electron Limited (TEL is a registered trademark or a trademark of Tok
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d86ac2543cf6f9727c795ff5a4bf5b9e
https://doi.org/10.1117/12.2551996
https://doi.org/10.1117/12.2551996
Publikováno v:
Sen'i Gakkaishi. 78:P-504
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd60b0f199ddcca325c873023a9fbd6d
https://doi.org/10.2115/fiber.78.p-504
https://doi.org/10.2115/fiber.78.p-504