Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Takaaki Ichikawa"'
Autor:
Daisuke Kobayashi, Attayeb Mohsen, Masakazu Sekijima, Tomoki Ito, M. Michael Gromiha, Masahiro Mochizuki, Mika Sakamoto, Kenji Mizuguchi, Modong Tan, Hideaki Umeyama, Nobuaki Yasuo, Shuntaro Chiba, Shogo Suzuki, Takashi Ishida, Kazuyoshi Ikeda, Daisuke Kihara, Yoshitaka Moriwaki, Yutaka Akiyama, Reiji Teramoto, A. Mary Thangakani, Shintaro Minami, Vipul Gupta, Mitsuo Iwadate, Chioko Nagao, Takaaki Ichikawa, Kazuki Yamamoto, Masahito Ohue, Itsuo Nakane, Kei Yura, Tatsuya Okuno, George Chikenji, Masahiro Kawatani, Kun Yi Hsin, Sakurako Takashina, Takatsugu Hirokawa, Woong-Hee Shin, Devadasan Velmurugan, Hayase Hakariya, Chandrasekaran Ramakrishnan, Ryunosuke Yoshino, Hironori K. Nakamura, Philip Prathipati, Nobuaki Miura, Hiroaki Kitano, Sergey Zozulya, Mari Ito, Akiko Higuchi, Teruki Honma, Petro Borysko, Keita Oda, Anastasiia Gryniukova, Nanako Uchida, Kentaroh Kudoh
Publikováno v:
Scientific Reports
Scientific Reports, Vol 9, Iss 1, Pp 1-12 (2019)
Scientific Reports, Vol 9, Iss 1, Pp 1-12 (2019)
Potential inhibitors of a target biomolecule, NAD-dependent deacetylase Sirtuin 1, were identified by a contest-based approach, in which participants were asked to propose a prioritized list of 400 compounds from a designated compound library contain
Autor:
Kwonsu Cheon, Jung Hee Yun, Yoko Oikawa, Kavalipurapu Kalyan C, Ali Mohammadzadeh, Sule Purval S, Ted Pekny, Bernardino Tronca, Dan Nguyen, Feng Pan, Yasuhiro Takashima, Tetsuji Manabe, Jason Guo, Michelle Luo, Violante Moschiano, Hyunseok Lee, Sumant Ramprasad, Satoru Tamada, Tommaso Vali, Daniel Shin, Kiranmayee Upadhyayula, Yuxing Liu, Mark A. Helm, Vipul Patel, Agostino Macerola, Ramin Ghodsi, Jeff Tsai, Jiro Kishimoto, Takaaki Ichikawa, Bemalkhedkar Trupti, Luca De Santis, Hidehiko Kuge, Toru Tanzawa, Daesik Song, Michele Incarnati, Srinivasan Dheeraj, Eric N. Lee, Luyen Vu, Yogesh Luthra, Midori Morooka, Yuichi Einaga, Jong Kang, Luigi Pilolli, Ali Feiz Zarrin Ghalam, Srinivasarao Deshmukh, Camila Jaramillo, Kim-Fung Chan, Girolamo Gallo, Qiang Tang, Jae-Kwan Park, Tomoharu Tanaka, Koichi Kawai, Massimo Rossini, Shigekazu Yamada, Piccardi Michele, Aaron Yip, Hoon Choi, Emanuele Sirizotti, Prabhu Naveen Vittal, Erwin E. Yu, Giovanni Santin
Publikováno v:
ISSCC
A planar floating-gate NAND technology has previously realized a 0.87Gb/mm2 memory density using 3b/cell [1] and achieved a minimum feature size for 16nm [2]. However, the development of planar NAND flash is expected to reach the scaling limit in a f
Autor:
Yutaka Tsujiuchi, Takahiko Sano, Takashi Goto, Makoto Horigane, Takaaki Ichikawa, Hiroshi Masumoto
Publikováno v:
Japanese Journal of Applied Physics. 57:03EK06
Publikováno v:
Journal of Crystal Growth. :690-693
In situ RHEED observation of dot-assembling process during the MBE growth of CdSe on ZnSe(1 0 0) by alternate supply of Se and Cd beams was studied. Two-monolayer CdSe wetting layer is formed on Zn-terminated ZnSe(1 0 0). The third CdSe layer is form
Autor:
Toru Tanzawa, F. Roohparvar, Takaaki Ichikawa, Satoru Tamada, P. Chiang, Tomoharu Tanaka, Koichi Kawai, Shigekazu Yamada, Jiro Kishimoto
Publikováno v:
ESSCIRC
A word-line voltage generator is proposed to compensate temperature variations in the threshold voltages of flash memory cells by mixing a first current with a negative temperature coefficient with a second current with zero temperature dependency wh
Autor:
Katie Nguyen, Yasuhiro Takashima, Chris Haid, Martin Szwarc, Vikram Mehta, Owen W. Jungroth, Andy Sendrowski, Hiroyuki Yokoyama, Satoru Tamada, Raymond W. Zeng, Bharat M. Pathak, Matthew Goldman, Tetsuji Manabe, Darshak Udeshi, Ravinder Kajley, Navneet Chalagalla, Tom Ryan, Daniel Elmhurst, Toru Tanzawa, Takaaki Ichikawa, William Sheung, Atif Huq, Mase J. Taub, Joel T. Jorgensen, Yoko Oikawa, Nishant Kajla, Midori Morooka, Tomoharu Tanaka, Koichi Kawai, Jiro Kishimoto, Dan Chu, Shigekazu Yamada, Rod Rozman, Ali Madraswala
Publikováno v:
ISSCC
As applications for NAND continue to grow and cost remains a primary market driver, it is necessary to deliver increased storage capacities at smaller process lithography while meeting high performance requirements [1,2]. Design plays a pivotal role
Publikováno v:
Thin Solid Films. 272:18-20
The oxidation behavior of Al-W alloy films (500 A) deposited on Cu as a passivation layer to protect Cu from oxidation has been examined by Auger electron spectroscopy and X-ray photoelectron spectroscopy. The preferential oxidation of Al in the Al-W
Autor:
Ryohei Matsueda, Hiroshi Masumoto, Yutaka Tsujiuchi, Hiroki Suzuki, Takaaki Ichikawa, Takashi Goto
Publikováno v:
Seibutsu Butsuri. 52:S50-S51
Autor:
Hideaki Sugawara, Yuuki Hiramitsu, Takaaki Ichikawa, Takashi Goto, Takahiko Sano, Yutaka Tsujiuchi, Hiroshi Masumoto
Publikováno v:
Seibutsu Butsuri. 52:S168
Autor:
Takuya Takahashi, Takashi Goto, Yoshiyuki Nomoto, Takaaki Ichikawa, Hiroshi Masumoto, Yuki Hiramitsu, Yutaka Tsujiuchi
Publikováno v:
Seibutsu Butsuri. 51:S106