Zobrazeno 1 - 10
of 135
pro vyhledávání: '"Taisuke Miura"'
Autor:
Ondřej Novák, Taisuke Miura, Martin Smrž, Michal Chyla, Siva Sankar Nagisetty, Jiří Mužík, Jens Linnemann, Hana Turčičová, Venkatesan Jambunathan, Ondřej Slezák, Magdalena Sawicka-Chyla, Jan Pilař, Stefano Bonora, Martin Divoký, Jakub Měsíček, Alina Pranovich, Pawel Sikocinski, Jaroslav Huynh, Patricie Severová, Petr Navrátil, David Vojna, Lucie Horáčková, Klaus Mann, Antonio Lucianetti, Akira Endo, Danijela Rostohar, Tomáš Mocek
Publikováno v:
Applied Sciences, Vol 5, Iss 4, Pp 637-665 (2015)
An overview of the latest developments of kilowatt-level diode pumped solid state lasers for advanced applications at the HiLASE Centre is presented. An overview of subcontracted and in-house-developed laser beamlines is presented. The aim of develop
Externí odkaz:
https://doaj.org/article/bd8a0db0aba8460c9b6a8e63fedf989b
Autor:
Martin Smrž, Ondřej Novák, Jiří Mužík, Hana Turčičová, Michal Chyla, Siva Sankar Nagisetty, Michal Vyvlečka, Lukáš Roškot, Taisuke Miura, Jitka Černohorská, Pawel Sikocinski, Liyuan Chen, Jaroslav Huynh, Patricie Severová, Alina Pranovich, Akira Endo, Tomáš Mocek
Publikováno v:
Applied Sciences, Vol 7, Iss 10, p 1016 (2017)
The development of kW-class diode-pumped picosecond laser sources emitting at various wavelengths started at the HiLASE Center four years ago. A 500-W Perla C thin-disk laser with a diffraction limited beam and repetition rate of 50–100 kHz, a freq
Externí odkaz:
https://doaj.org/article/07cca3696ebd492a9598d0bdeeaf9dd0
Autor:
Evgeny Malankin, Neal V. Lafferty, Mikhail Silakov, Ekaterina Semenova, Takamitsu Komaki, Kouichi Fujii, Taisuke Miura, Gouta Niimi, Taku Yamazaki
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d0c9d7b6396d725e7fe3c57149fbdf1
https://doi.org/10.1117/12.2614055
https://doi.org/10.1117/12.2614055
Publikováno v:
Yuki Tamaru, Atsushi Fuchimukai, Hiyori Uehara, Taisuke Miura, and Ryo Yasuhara, "Verdet constant dispersion of magnesium fluoride for deep-ultraviolet and vacuum-ultraviolet Faraday rotators," Opt. Express 31, 7807-7812 (2023)
The Verdet constant dispersion in magnesium fluoride (MgF2) crystals was evaluated over a wavelength range of 190–300 nm. The Verdet constant was found to be 38.7 rad/(T·m) at a wavelength of 193 nm. These results were fitted using the diamagnetic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bff17cffcd9f6e270eaac46231993be1
https://doi.org/10.1364/oe.481745
https://doi.org/10.1364/oe.481745
Publikováno v:
Yuki Tamaru, Hikaru Kumai, Atsushi Fuchimukai, Hiyori Uehara, Taisuke Miura, and Ryo Yasuhara, "Effect of erbium concentration on the Verdet constant dispersion of LiY1.0-xErxF4 single crystal," Opt. Mater. Express 12, 1427-1432 (2022)
The dispersion of the Verdet constant of LiY1.0-xErxF4 crystals was evaluated from 190 nm to 500 nm for different doping concentrations of Er ions. A 15% doping concentration yielded a high Verdet constant of 54.5 rad/(T·m) at 193 nm. This value can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d310ef6dab1fa5bd17cc92b5415ab1d
https://doi.org/10.1364/ome.447507
https://doi.org/10.1364/ome.447507
Autor:
Hakaru Mizoguchi, Ryoichi Nohdomi, Yuujirou Sasaki, Hiroaki Oizumi, Yasuhiro Kamba, Takashi Onose, Junichi Fujimoto, Hironori Igarashi, Chen Qu, Yohei Tanaka, Atsushi Fuchimukai, Taisuke Miura, Yuki Tamaru, Yoshihiko Murakami
Publikováno v:
High-Power Laser Materials Processing: Applications, Diagnostics, and Systems IX.
Deep ultra-violet (DUV) laser and short pulse lasers are used for laser processing, because they can decrease the heat effect for process materials. We are developing a hybrid ArF excimer laser that is consists of a solid-state laser, multi wavelengt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f27f3e1d719a4c70c1f46d94bf9063f5
https://doi.org/10.1117/12.2549826
https://doi.org/10.1117/12.2549826
Autor:
Yasuhiro Kamba, Yoshihiko Murakami, Hiroaki Oizumi, Kouji Kakizaki, Takashi Onose, Taisuke Miura, Hironori Igarashi
Publikováno v:
Laser Congress 2020 (ASSL, LAC).
We demonstrated a precise laser machining on SiC/SiC CMC plate using short pulsed hybrid ArF laser at the wavelength of 193 nm. We made 3x3 squared holes with dimension of 0.4×0.4 mm2.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b6db34928d6dc6cb5cb8843505c4d9e
https://doi.org/10.1364/assl.2020.jth6a.26
https://doi.org/10.1364/assl.2020.jth6a.26
Autor:
Chen Qu, Yoshihiko Murakami, Hironori Igarashi, Yohei Tanaka, Yuki Tamaru, Taisuke Miura, Kouji Kakizaki, Atsushi Fuchimukai
Publikováno v:
Laser Congress 2020 (ASSL, LAC).
We report a 193 nm solid state laser based on 1030 nm laser and 1550 nm laser which is generated by two-stage OPA. 110 mW output power and 0.5 pm spectral width was achieved.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5aab3f19d1fa968cf54f5f6396503021
https://doi.org/10.1364/assl.2020.jth6a.2
https://doi.org/10.1364/assl.2020.jth6a.2
Publikováno v:
Laser Congress 2020 (ASSL, LAC).
Verdet constant dispersion in synthetic quartz was evaluated with DUV light sources. The Verdet constant at 221 nm was determined to be 41.1 rad/Tm. The DUV optical isolator can realize with the moderate magnetic field.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d86e1c6ce14f53e541ed371c5b043e48
https://doi.org/10.1364/assl.2020.jth6a.19
https://doi.org/10.1364/assl.2020.jth6a.19
Autor:
Hironori Igarashi, Yuki Tamaru, Chen Qu, Taisuke Miura, Junichi Fujimoto, Yasuhiro Kamba, Hakaru Mizoguchi, Yoshihiko Murakami, Atsushi Fuchimukai
Publikováno v:
Scopus-Elsevier
Deep ultraviolet (DUV) lasers are actively used for semiconductor lithography. Argon fluoride excimer laser (ArF excimer laser) is the typical light source which can generate above 100-W optical power at the wavelength of below 200-nm with several te
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::99344bed672bdb75a62e6489fd399ad3
https://doi.org/10.1109/cleoe-eqec.2019.8872141
https://doi.org/10.1109/cleoe-eqec.2019.8872141