Thickness control in electrogenerated mesoporous silica films by wet etching and electrochemical monitoring of the process

Autor: Taisiia Sikolenko, Christelle Despas, Neus Vilà, Alain Walcarius

Publikováno v: Electrochemistry Communications, Vol 100, Iss , Pp 11-15 (2019)

Vertically aligned mesoporous silica films can be generated by electrochemically assisted self-assembly (EASA) but the accurate control of their thickness is essentially restricted to the 100 nm range. Here we have developed a wet etching approach us

Externí odkaz: https://doaj.org/article/7018c27013bb43018e783c69a1a2cb26

Thickness control in electrogenerated mesoporous silica films by wet etching and electrochemical monitoring of the process

Autor: Christelle Despas, Taisiia Sikolenko, Alain Walcarius, Neus Vilà

Publikováno v: Electrochemistry Communications
Electrochemistry Communications, Elsevier, 2019, 100, pp.11-15. ⟨10.1016/j.elecom.2019.01.013⟩
Electrochemistry Communications, Vol 100, Iss, Pp 11-15 (2019)

Vertically aligned mesoporous silica films can be generated by electrochemically assisted self-assembly (EASA) but the accurate control of their thickness is essentially restricted to the 100 nm range. Here we have developed a wet etching approach us

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::72efcfeed7c091058b5cb9706f9e205c
https://hal.univ-lorraine.fr/hal-02089703