Zobrazeno 1 - 10 of 14 pro vyhledávání: '"Taishi FURUKAWA"'
5
Probabilistic predictor of seismic demand on SMRF based on natural-period-dependent spectrum intensity
Autor: Yasuhiro Mori, Taishi Furukawa
Publikováno v: Structural Safety. 89:102040
The objectives of this study is to develop a framework for estimating the exceedance probability p ex of the maximum inter-story drift ratio (ISDR) at each story of an SMRF based on the previously proposed techniques for predicting the responses for
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c979304f0427345a92f77bb066d3ac26
https://doi.org/10.1016/j.strusafe.2020.102040
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7
Novel Highly Volatile MOCVD Precursors for Ta2O5 and Nb2O5 Thin Films
Autor: Koichi Fujimoto, Toshiki Yamamoto, Kenichi Tada, Taishi Furukawa, Tadahiro Yotsuya, Takao Suzuki, Koichiro Inaba, Noriaki Oshima, Tetsu Yamakawa, Hirokazu Chiba, Hiroshi Funakubo
Publikováno v: ECS Transactions. 16:243-251
Novel Ta and Nb compounds Ta(NtBu)(OtBu)3 (1) and Nb(NtBu)(OtBu)3 (2) were prepared as volatile liquid precursors for the MOCVD process. Ta2O5 and Nb2O5 films were obtained by using 1 and 2 in a lower temperature regime than pentaethoxy tantalum (PET
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b353f3251ad70581b6d64edded75b973
https://doi.org/10.1149/1.2981607
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8
Fabrication of Ir-Based Electrodes by Metal Organic Chemical Vapor Deposition Using Liquid Ir Precursors
Autor: Naoya Iwamoto, Noriaki Oshima, Masaru Shimizu, Taishi Furukawa, Kazuhisa Kawano, S. Watari, Hironori Fujisawa
Publikováno v: Japanese Journal of Applied Physics. 45:7354-7359
Ir-based electrodes were fabricated by metal organic chemical vapor deposition (MOCVD) using a newly developed liquid precursor, (ethylcyclopentadienyl)bis(ethylene) iridium [Ir(EtCp)(C2H4)2], with a lower decomposition temperature than previous prec
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bcce57e3ac2b65e0931c1027a0260e6e
https://doi.org/10.1143/jjap.45.7354
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9
Characterization of Ru thin films from a novel CVD/atomic layer deposition precursor 'Rudense' for capping layer of Cu interconnects
Autor: Hiroyuki Oike, Hirokazu Chiba, Taishi Furukawa, Atsushi Maniwa, Ken-ichi Tada, Kazuhisa Kawano, Koiso Naoyuki
Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 33:01A133
The authors have succeeded in development of a novel Ru precursor, Ru(EtCp)(η5-CH2C(Me)CHC(Me)O) [Rudense], for CVD and atomic layer deposition (ALD) processes under nonoxidative condition. Rudense has sufficient vapor pressure and good thermal stab
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f20cd2cfdac61566dd54aa5f6c001530
https://doi.org/10.1116/1.4902560
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10
A Novel MO Precursor for Metal Tantalum and Tantalum Nitride Film
Autor: Ken-ichi Tada, Kenichi Sekimoto, Noriaki Oshima, Taishi Furukawa, Tetsu Yamakawa
Publikováno v: MRS Proceedings. 914
A novel tantalum precursor, bis(ethylcyclopentadienyl)hydridocarbonyltantalum (Ta(EtCp)2(CO)H EtCp:ethylcyclopentadienyl), for chemical vapor deposition (CVD) and atomic layer deposition (ALD) was synthesized. The molecular structure of this precurso
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d7da2d9c79e98115b2f11303a299af9b
https://doi.org/10.1557/proc-0914-f09-03
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