Zobrazeno 1 - 2
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pro vyhledávání: '"Taihei Mori"'
Autor:
Taihei Mori, Yosuke Okamoto, Masahiro Oya, Shinji Mizutani, Shinichi Nakazawa, Kotaro Maruyama, Yuichiro Yamazaki
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Taihei Mori, Shinichi Nakazawa, Yuichiro Yamazaki, Seulki Kang, Yosuke Okamoto, Kotaro Maruyama, Akinori Kawamura
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
The precise metrology for edge placement error (EPE) is required especially in EUV era. Last year, we proposed new contour extraction algorithm using machine learning and verified the robustness to SEM noise on AEI pattern. In this study, we suggest