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Autor:
Taigo Fujii, Amir Moqanaki, Christof Zillner, Harald Höller, Elmar Platzgummer, Masakazu Hamaji
Publikováno v:
Photomask Technology 2021.
The semiconductor industry's migration to EUV for the leading-edge nodes provides significant advantages and poses new challenges for the mask writers. The mask quality requirements for the leading-edge process technology call for ILT (Inverse Lithog