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Autor:
Young-Woo Ok, Tai Yeon Seong, Joo-Hyoung Lee, Key Min Lee, Shiva S. Hullavarad, Chel-Jong Choi, Young-Jin Park
Publikováno v:
Journal of The Electrochemical Society. 149:G517
The effects of hydrogen implantation on the structural and electrical properties of nickel silicide have been investigated. Ni films (30 nm) are electron-beam-evaporated on Si substrates, after which plasma immersion ion implantation is used to intro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba4ca69ff247aee7712b5c78c2855038
https://doi.org/10.1149/1.1495911
https://doi.org/10.1149/1.1495911
