Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Tai Fong Chao"'
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::102fdeddf2ba2d4f8a64cef2e4f623d4
https://doi.org/10.1109/asmc.2017.7969253
https://doi.org/10.1109/asmc.2017.7969253
Publikováno v:
ECS Meeting Abstracts. :1274-1274
Poly silicon is the preferred gate material in terms of fabrication process in the fab, and gate height control is one of the factors determining transistor performance. If we can have a better uniformity control of poly CMP, it will be beneficial no
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a94e891b7e305be2c7aaba3c411bff90
https://doi.org/10.1149/ma2017-01/26/1274
https://doi.org/10.1149/ma2017-01/26/1274