Zobrazeno 1 - 10
of 82
pro vyhledávání: '"Tai D. Nguyen"'
Autor:
D. Petersohn
Publikováno v:
Materials and Corrosion/Werkstoffe und Korrosion. 47:581-581
Publikováno v:
Journal of Software: Evolution and Process.
Publikováno v:
IEEE Symposium on Security and Privacy
Smart contracts are distributed, self-enforcing programs executing on top of blockchain networks. They have the potential to revolutionize many industries such as financial institutes and supply chains. However, smart contracts are subject to code-ba
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::504fcfda5f54d3e84a84f9199ed2c03e
http://arxiv.org/abs/2101.01917
http://arxiv.org/abs/2101.01917
Publikováno v:
ICSE
Smart contracts are Turing-complete programs that execute on the infrastructure of the blockchain, which often manage valuable digital assets. Solidity is one of the most popular programming languages for writing smart contracts on the Ethereum platf
Publikováno v:
Journal of Materials Research. 8:2354-2361
The interaction of cobalt (Co) and low-pressure chemical-vapor-deposited silicon nitride (LPCVD Si3N4) during anneals from 200 °C−1000 °C in vacuum, Ar, and Ar–H2 ambient (95% Ar and 5% H2) has been studied. After the anneals, reduction of Si3N
Publikováno v:
Journal of Electron Microscopy Technique. 19:473-485
A simple method for preparing cross-sectional transmission electron microscopy specimens and discussions of possible artifacts from specimen preparation and observation of x-ray multilayer thin film structures are presented. The specimen preparation
Publikováno v:
Journal of Applied Physics. 70:3301-3313
Thin (3–300‐nm) oxides were grown on single‐crystal silicon substrates at temperatures from 523 to 673 K in a low‐pressure electron cyclotron resonance (ECR) oxygen plasma. Oxides were grown under floating, anodic or cathodic bias conditions,
Autor:
Eberhard Spiller, Marco Wedowski, Troy W. Barbee, Tai D. Nguyen, James A. Folta, Claude Montcalm, R. Fred Grabner, Saša Bajt, Paul B. Mirkarimi, Mark A. Schmidt, Christopher C. Walton
Publikováno v:
SPIE Proceedings.
Multilayer mirror coatings which reflect extreme UV (EUV) radiation are a key enabling technology for EUV lithography but must meet stringent requirements in terms of film quality, stability, and thickness control across multi optical elements up to
Autor:
Tai D. Nguyen, Troy W. Barbee
Publikováno v:
SPIE Proceedings.
The authors report a study of the residual stresses and residual stress relaxation in Mo/Si and Mo{sub 2}C/Si EUV multilayers. The multilayers were fabricated by magnetron sputter deposition, and stress measured using the substrate curvature laser sc
Autor:
Tai D. Nguyen, Troy W. Barbee
Publikováno v:
MRS Proceedings. 522
The microstructure and mechanical properties of sputtered Cu/Ta multilayers were studied. X- ray diffraction and transmission electron microscopy characterization indicate that both the Ta and Cu in the 2 nm period multilayer are predominantly amorph