Zobrazeno 1 - 10
of 130
pro vyhledávání: '"Tahone Yang"'
Autor:
Jeng-Hwa Liao, Jung-Yu Hsieh, Ling-Wu Yang, Tahone Yang, Kuang-Chao Chen, Baonian Guo, Monica Hsiao, Shiryu Lee, Fenglin Wang, Sungho Jo, Kyuha Shim
Publikováno v:
MRS Advances. 7:1534-1539
Autor:
Yao-An Chung, Yuan-Chieh Chu, Chih-Chin Chang, Hong-Ji Lee, Nan-Tzu Lian, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Autor:
Chih-Chin Chang, Ching-Hung Hsiao, Yi-Che Chen, Ching-Hung Wang, Yao-An Chung, Li-Wei Wang, Hong-Ji Lee, Nan-Tzu Lian, Shih-Chin Lee, Tzung-Ting Han, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Autor:
Hsiang-Meng Yu, Chih-Chen Lin, Min-Hsuan Hsu, Yen-Ting Chen, Kuang-Wei Chen, Tuung Luoh, Ling-Wuu Yang, Tahone Yang, Kuang-Chao Chen
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 34:280-285
Autor:
Jeng-Hwa Liao, Zong-Jie Ko, Hsing-Ju Lin, Jung-Yu Hsieh, Ling-Wu Yang, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu
Publikováno v:
Solid-State Electronics. 202:108620
Autor:
Yu-Fan Chang, Hong-Ji Lee, Fu-Hsing Chou, Shih-Chin Lee, Yao-An Chung, Nan-Tzu Lian, Tzung-Ting Han, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu
Publikováno v:
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Autor:
Yao-An Chung, Yuan-Chieh Chiu, Yu-Fan Chang, Hong-Ji Lee, Nan-Tzu Lian, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu
Publikováno v:
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Autor:
Chih-Chen Lin, Tuung Luoh, Min-Hsuan Hsu, Ling-Wuu Yang, Kuang-Chao Chen, Hsiang-Meng Yu, Tahone Yang, Kuang-Wei Chen
Publikováno v:
2021 IEEE International Interconnect Technology Conference (IITC).
Chemical-mechanical polishing closed loop control optimized process with machine learning assisted wafer image analysis algorithm implemented on the inter layer dielectric of 3D NAND ON stacking with poly-silicon stop layer is studied. The grayscale
Autor:
Shao-Lou Jheng, Jyunhong Wu, Zusing Yang, Yuan-Chieh Chiu, Ming-Tsung Wu, Hong-Ji Lee, Nan-Tzu Lian, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu
Publikováno v:
2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Autor:
Nan-Tzu Lian, Tahone Yang, Yao-Yuan Chang, Zusing Yang, Hong-Ji Lee, Chih-Yuan Lu, Kuang-Chao Chen, Ming-Tsung Wu
Publikováno v:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
The challenges of oval-shaped silicon dioxide and polysilicon (OP)-layer hole etching, including shape deformation, local arcing, and adjacent hole bridging are reported. We explore the shape deformation evolution step by step and point out that wigg