Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Taher Kagalwala"'
Publikováno v:
BMJ Paediatrics Open, Vol 4, Iss 1 (2020)
Objective To carry out a systematic review of the available studies on COVID-19 (coronavirus disease 2019) in neonates seen globally since the onset of the COVID-19 global pandemic in 2020. The paper also describes a premature baby with reverse trans
Externí odkaz:
https://doaj.org/article/843e86f3a71e4df29b4534eb9d6182b7
Autor:
Paul K. Isbester, Ganesh Subramanian, Padraig Timoney, Taher Kagalwala, Dmitry Kislitsyn, Heath Pois, Mark Klare, Daniel Kandel, Michal Yachini, Wei Ti Lee, Vanessa Zhang, Mitch Shiver, Saurabh Singh, Parker Lund
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3907f9accb166af3b563d12d4ec5228
https://doi.org/10.1117/12.2614116
https://doi.org/10.1117/12.2614116
Autor:
Yevgeny Lifshitz, Jeffrey Wood, David Novack, Jack Downey, Dinay Dash, Shiladitya Chakravorty, Michael Raga-Barone, Taher Kagalwala, Alfred Hajtman, John Byrnes, Csaba Nándor Bitvai, Anna Bölcskei-Molnár, Peter Basa
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5997f1d3f7674658954d6d23ea3f3964
https://doi.org/10.1117/12.2614337
https://doi.org/10.1117/12.2614337
Autor:
Cheuk Wun Wong, Taher Kagalwala, Tam Vuong, Neelima Rathi, Patrick Snow, Karsten Gutjahr, Gorby Wan, Tony Joung, Apollo Marmarinos
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
This paper presents a new overlay metrology target design and scheme referred as MoireOVLTM. It utilizes Moire patterns of two overlapping gratings to amplify the kernel response to overlay misalignment and thereby has the potential to enhance kernel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3cd3e79ed70a25aba6506919e9201bb
https://doi.org/10.1117/12.2583733
https://doi.org/10.1117/12.2583733
Publikováno v:
BMJ Paediatrics Open
BMJ Paediatrics Open, Vol 4, Iss 1 (2020)
BMJ Paediatrics Open, Vol 4, Iss 1 (2020)
ObjectiveTo carry out a systematic review of the available studies on COVID-19 (coronavirus disease 2019) in neonates seen globally since the onset of the COVID-19 global pandemic in 2020. The paper also describes a premature baby with reverse transc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb8304113239c1b76dc2e1b070cc67df
Autor:
Kevin Drayton, Matthew Sendelbach, Alexander Elia, Padraig Timoney, Susan Emans, Darren Zingerman, Marjorie Cheng, Benny Vilge, Charles Kang, Timothy Hughes, Taher Kagalwala, Naren Yellai, Alok Vaid, Jason Emans, Ronald Fiege
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In semiconductor manufacturing, the time it takes for wafers to process through the line is of utmost importance. Any delay in the processing of these wafers is very costly to the foundry and the end customer. Cycle time is one of the key metrics tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c28b5540552f4f3f687d57735f5ebe1
https://doi.org/10.1109/asmc.2019.8791789
https://doi.org/10.1109/asmc.2019.8791789
Autor:
Padraig Timoney, Dhairya Dixit, Nick Keller, Taher Kagalwala, Alexander Elia, Alok Vaid, Yudesh Ramnath, Ninad Paranjape, Sonal Dey
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Optical scatterometry or optical critical dimension (OCD) is a well-known inline metrology technique in semiconductor manufacturing especially in advanced technology nodes. OCD metrology technique has high precision, throughput, accuracy, and process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86f117ce34b7336b10067b3ea10fae10
https://doi.org/10.1109/asmc.2019.8791810
https://doi.org/10.1109/asmc.2019.8791810
Publikováno v:
ECS Journal of Solid State Science and Technology. 5:P404-P408
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::969fe1ee6222cbcdc2f3b9a4e43bea38
https://doi.org/10.1149/2.0161607jss
https://doi.org/10.1149/2.0161607jss
Autor:
Taher, Kagalwala
Publikováno v:
Indian pediatrics. 55(10)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::3a28dfdfac862ca6b3116a738c4bbe9a
https://pubmed.ncbi.nlm.nih.gov/30129533
https://pubmed.ncbi.nlm.nih.gov/30129533
Autor:
Paul Isbester, Houssam Lazkani, Jonathan Hurley, Haibo Liu, Michael Shifrin, Taher Kagalwala, Naren Yellai, Charles Kang, Edward Reis, Yoav Etzioni, Padraig Timoney
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
In recent years, the combination of device scaling, complex 3D device architecture and tightening process tolerances have strained the capabilities of optical metrology tools to meet process needs. Two main categories of approaches have been taken to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::657115a084d92440f6a588ab92d8d133
https://doi.org/10.1117/12.2300167
https://doi.org/10.1117/12.2300167