Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Tae-O Jung"'
Autor:
Seung-Jin Yeom, Jeongsoo Park, Kyung-Bo Ko, Jung-Hak Lee, Hyun-Wook Nam, Tae-Hang Ahn, Y. Son, Ki-Sik Choi, Tae-Young Jang, Keundo Ban, Tae-O Jung, Sun-Woo Lee, Hyunjin Lee, Jae-Hwan Han, Noh-Jung Kwak, Il-Sik Jang, Byungil Kwak, Dong-Kyu Lee, Su-Bum Shin, Jin-Sung Kim, Hyung-Chul Kim, Seung-Beom Baek, Eun-Hyup Doh, Yun-Hyuck Ji, Seung-Mi Lee, Yu-Jun Lee, Jae-Sang Lee, Sung-Hyuk Cho, Mun-Mo Jeong, Dong-Kyun Kang, Sung-Kye Park, Min-Chul Sung, Se-Aug Jang, Heung-Jae Cho, Jae-Il Kang, Sung-Joo Hong, Jae-Seon Yu, Ji-Hye Han
Publikováno v:
2015 IEEE International Electron Devices Meeting (IEDM).
It is the first time that the high-k/metal gate technology was used at peripheral transistors for fully integrated and functioning DRAM. For cost effective DRAM technology, capping nitride spacer was used on cell bit-line scheme, and single work func
Autor:
Sung, Minchul, Jang, Se-Aug, Lee, Hyunjin, Ji, Yun-Hyuck, Kang, Jae-Il, Jung, Tae-O, Ahn, Tae-Hang, Son, Yun-Ik, Kim, Hyung-Chul, Lee, Sun-Woo, Lee, Seung-Mi, Lee, Jung-Hak, Baek, Seung-Beom, Doh, Eun-Hyup, Cho, Heung-Jae, Jang, Tae-Young, Jang, Il-Sik, Han, Jae-Hwan, Ko, Kyung-Bo, Lee, Yu-Jun
Publikováno v:
2015 IEEE International Electron Devices Meeting (IEDM); 1/1/2015, p1.4-26.6.4, 0p