Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Tadayoshi Kokubo"'
Autor:
Fumiyuki Nishiyama, Tsukasa Yamanaka, Kenichiro Sato, Kunihiko Kodama, Tadayoshi Kokubo, Makoto Momota, Shinnichi Kanna, Shiro Tan, Yasumasa Kawabe, Hyou Takahashi
Publikováno v:
Journal of Photopolymer Science and Technology. 17:501-509
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59cdbb9f08884529bb1b9087551f9609
https://doi.org/10.2494/photopolymer.17.501
https://doi.org/10.2494/photopolymer.17.501
Autor:
Shinichi Kanna, Morio Yagihara, Tadayoshi Kokubo, Sanjay Malik, Kazuyoshi Mizutani, Stephanie Dilocker, Shoichiro Yasunami, Shiro Tan, Yasumasa Kawabe
Publikováno v:
Journal of Photopolymer Science and Technology. 16:595-600
Resist materials for 157 nm lithography is believed to be one of the key technology for producing patterns below 70 nm. Many different types of fluorine-containing polymer platforms have been energetically pursued by a number of researchers, and some
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55a78a6d6a8c309d577af5bfc9fda176
https://doi.org/10.2494/photopolymer.16.595
https://doi.org/10.2494/photopolymer.16.595
Autor:
Andrew J. Blakeney, John P Hatfield, Binod De, Plamen Tzviatkov, Scott Scales, Stephanie Dilocker, Jeff Eisele, Murrae J. Bowden, Sanjay Malik, Tadayoshi Kokubo
Publikováno v:
Journal of Photopolymer Science and Technology. 15:637-642
Optical absorbance data on a variety of acetal-derivatized hydroxystyrene based polymers are reported at 157nm. Acetals based on tertiary butyl, cyclohexyl ethyl and a silicon-derivative show improved transparency of the corresponding polymers compar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8caec4cde41cac5a297fe461654665e
https://doi.org/10.2494/photopolymer.15.637
https://doi.org/10.2494/photopolymer.15.637
Autor:
Yasumasa Kawabe, Shiro Tan, Larry Ferreira, Sanjay Malik, Allyn Whewell, Murrae J. Bowden, Tadayoshi Kokubo, Tori Fujimori, Jeff Eisele
Publikováno v:
Journal of Photopolymer Science and Technology. 13:507-512
The outgassing issues that have long plagued conventional acetal resist designs are shown to be significantly mitigated depending on the structure of the acetal-blocked polymer. Resists formulated with acetal-blocked polymers based on low molecular w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cab3bccebd158d86bc850cc73cfcb5d5
https://doi.org/10.2494/photopolymer.13.507
https://doi.org/10.2494/photopolymer.13.507
Autor:
Lawrence Ferreira, Toru Fujimori, Allyn Whewell, Veerle Van Driessche, Brian Maxwell, Kazuya Uenishi, Thomas R. Sarubbi, Yasumasa Kawabe, Toshiaki Aoai, Tadayoshi Kokubo, Andrew J. Blakeney, Murrae J. Bowden, Shiro Tan, Sanjay Malik
Publikováno v:
Journal of Photopolymer Science and Technology. 12:591-600
Physical and lithographic properties of structurally diverse acetal-derivatized hydroxy styrene polymers are reported. The dissolution and thermal properties of the acetal-blocked-polymers vary with the size of the pendent acetal moiety. The lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ed89aa9bd6cb9b41e7a0844fb651a16
https://doi.org/10.2494/photopolymer.12.591
https://doi.org/10.2494/photopolymer.12.591
Publikováno v:
Journal of Photopolymer Science and Technology. 3:389-400
A Chemical Amplification system using silylether and silylester polymers as an acid labile compound was investigated. The effects of their structural parameters were examined in terms of their acid catalyzed decomposition rates. A bulkiness of the su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dae794e957c2064323d08f0045327595
https://doi.org/10.2494/photopolymer.3.389
https://doi.org/10.2494/photopolymer.3.389
Autor:
Yasumasa Kawabe, Makoto Momota, Shinichi Kanna, Kunihiko Kodama, Fumiyuki Nishiyama, Tadayoshi Kokubo, Kenichiro Sato, Hyou Takahashi, Shiro Tan, Tsukasa Yamanaka
Publikováno v:
SPIE Proceedings.
Transparency of the resist film at exposure wavelength affects lithographic performances, such as sensitivity, profile and resolution. Not only binder polymer, but also photo acid generator (PAG) itself has a significant impact on transparency of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dae3c3e7ddb9c59c5405b038db5cd40f
https://doi.org/10.1117/12.538049
https://doi.org/10.1117/12.538049
Autor:
Morio Yagihara, Stephanie Dilocker, Shiro Tan, Sanjay Malik, Tadayoshi Kokubo, Shinichi Kanna, Shoichiro Yasunami, Kazuyoshi Mizutani, Yasumasa Kawabe
Publikováno v:
Advances in Resist Technology and Processing XX.
Resist materials for 157nm lithography is believed to be one of the key technology for producing patterns below 70nm. Many different types of fluorine-containing polymer platforms have been energetically pursued by a number of researchers, and some o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f20c4365846954ed0d48c38528e15bbe
https://doi.org/10.1117/12.485185
https://doi.org/10.1117/12.485185
Autor:
Thomas R. Sarubbi, Shiro Tan, Sanjay Malik, Brian Maxwell, Yasumasa Kawabe, Andrew J. Blakeney, Toru Fujimori, Lawrence Ferreira, Kazuya Uenishi, Tadayoshi Kokubo, Murrae J. Bowden, Allyn Whewell, Veerle Van Driessche, Toshiaki Aoai
Publikováno v:
SPIE Proceedings.
Lithographic properties of a variety of acetal-derivatized styrene based polymers are reported. The structural modifications in the polymers involve varying the size of the pendent acetal moiety. the lithographic performances of the resists containin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::659ac43948df58fe4b07f51e34aa7bc9
https://doi.org/10.1117/12.350222
https://doi.org/10.1117/12.350222
Autor:
Yasumasa Kawabe, Tadayoshi Kokubo, Lawrence Ferreira, Fumiyuki Nishiyama, Shinji Sakaguchi, Andrew J. Blakeney, Shiro Tan
Publikováno v:
SPIE Proceedings.
Effects of a dissolution promoter (DP) on the lithographic behavior of DNQ-novolac resists were investigated. The key structure/property relationships of the DP in relation to other parameters of the resist components were identified. In this work, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c484b193cd7a4be99c01da04ee8d79b
https://doi.org/10.1117/12.241841
https://doi.org/10.1117/12.241841