Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Tadashi Januma"'
Autor:
Mitsuo Koshi, Tadashi Januma, Masakazu Sugiyama, Ryosuke Shimizu, Masaaki Ogino, Yukihiro Shimogaki
Publikováno v:
MRS Proceedings. 716
Thickness uniformities of poly-crystalline silicon thin films, deposited by a commercial LPCVD reactor, were investigated through a phenomenological and elementary reaction analysis. To understand the deposition rate and its profile in radius directi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::73e6900bafe4accfc6b550d37f452c07
https://doi.org/10.1557/proc-716-b11.9
https://doi.org/10.1557/proc-716-b11.9
