Zobrazeno 1 - 10
of 14
pro vyhledávání: '"TOSHIRO TSUMORI"'
Publikováno v:
SPIE Proceedings.
A new high performance anti-reflective layer (ARL) for the i-line, KrF, and even for the ArF excimer laser lithography has been developed. It makes the KrF excimer laser (248 nm) lithography into a robust mass production tool beyond 2nd generation of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c50639d4a8e2905d5f27b5ec5869247c
https://doi.org/10.1117/12.175463
https://doi.org/10.1117/12.175463
Publikováno v:
SPIE Proceedings.
A new exposure method for the depth of focus enhancements without using the off axis filter has been developed. It makes KrF excimer laser (248 nm) lithography to a robust mass production tool beyond 2nd generation of 64 MDRAM class devices. With thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1bac87fb612f8441ddd3331f4cc3e3ad
https://doi.org/10.1117/12.175425
https://doi.org/10.1117/12.175425
Publikováno v:
SPIE Proceedings.
A new complete anti-reflective layer (ARL) for KrF excimer laser lithography, which becomes an excimer laser lithography to a practical mass production tool beyond 0.35 micrometers rule devices, is developed. This new ARL, whose material is a type of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ea0035aecb0ab78e3cec8a27fb0b22e
https://doi.org/10.1117/12.150431
https://doi.org/10.1117/12.150431
Publikováno v:
SPIE Proceedings.
This paper describes a new anti-reflective coating (ARC) optimization methodology, and reports a practical new ARC material and its actual performance for KrF excimer laser lithography as an application of this methodology. First, the optimal optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f0ad6ac179f850aa7bf011bee7b3a59
https://doi.org/10.1117/12.130335
https://doi.org/10.1117/12.130335
Publikováno v:
Japanese Journal of Applied Physics. 31:4492
Focusing characteristics of an ion beam from a He field ion source were investigated. For a W emitter as installed, a beam with an ion current of 0.7 pA was focused into 0.2 µm because the angular current density did not exceed 0.02 µA/sr. Improvem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::192fb1018b7f1a9532a01ec8f1db4843
https://doi.org/10.1143/jjap.31.4492
https://doi.org/10.1143/jjap.31.4492
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:2576
0.35 μm design rule device patterns were fabricated using high absorption‐type positive and negative photoresist with a KrF excimer laser stepper. The main reason for using high absorption‐type photoresist was to minimize the thin film interfere
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3f140f04a0e7b0ded3f96b9a3f4aa23
https://doi.org/10.1116/1.586330
https://doi.org/10.1116/1.586330
Autor:
Hideo Nagata, Akira Yokota, Yasuaki Nakane, Minoru Tsuda, Toshiro Tsumori, Yohichi Nakamura, Setsuko Oikawa, Hisashi Nakane
Publikováno v:
ACS Symposium Series ISBN: 9780841205406
Modification of Polymers
Modification of Polymers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b234455afc51b9b383d135e2ec27596
https://doi.org/10.1021/bk-1980-0121.ch018
https://doi.org/10.1021/bk-1980-0121.ch018
Publikováno v:
SPIE Proceedings.
New PCM (Portable Conformable Mask) method for excimer laser lithography has been developed. It consists of RD2000N (Hitachi Chemical Co., Ltd) as the top imaging layer, and PMGI (Poly-dimethyl glutarimide, Shipley Co., Ltd) as the bottom planarizing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2bec68a5d22515aa354574b001abfd6a
https://doi.org/10.1117/12.968417
https://doi.org/10.1117/12.968417
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 6:498
A helium field ion gun for a focused ion beam system was designed and constructed. The main feature of the ion gun structure is the use of a gas jet nozzle with a tungsten field emitter tip near the nozzle end. Since the helium gas jet is collimated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2ca2b2f8c15a30ecf4d096c5ff674e0
https://doi.org/10.1116/1.584051
https://doi.org/10.1116/1.584051
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.