Zobrazeno 1 - 10
of 89
pro vyhledávání: '"TAKUMI UENO"'
Publikováno v:
2023 IEEE International Conference on Mechatronics (ICM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c27cdaa84b2b0bf7b7cadd5dac69d04
https://doi.org/10.1109/icm54990.2023.10102086
https://doi.org/10.1109/icm54990.2023.10102086
Negative tone resists based on acid-hardening resin chemistry are three-component systems composed of a novolac resin, a melamine crosslinking agent, and a radiation-sensitive acid generator. The copolymerization chemistry of maleic anhydride/cyclic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad87c5c5f6a08560f91f2f36a6f8b163
https://doi.org/10.1201/9781315117171-7
https://doi.org/10.1201/9781315117171-7
Publikováno v:
Journal of Photopolymer Science and Technology. 18:327-332
Polyimides are commonly used as a thermally stable insulator for semiconductors. To assure adequate chemical or physical properties, a layer of their precursors has to be cured in a convection oven at more than 300 °C. In this paper, we compare vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f63fd03df0311806ae56abdddff921cc
https://doi.org/10.2494/photopolymer.18.327
https://doi.org/10.2494/photopolymer.18.327
Publikováno v:
Macromolecules. 33:6794-6799
The effect of the addition of carbonyl compounds such as amide, imide, urea, and ester derivatives on the dissolution rate of carboxyl-group-containing polymers in an alkaline solution was investigated. Urea derivatives lowered the dissolution rate o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcea6ff5075ebad487a8ea69a553fc10
https://doi.org/10.1021/ma000680q
https://doi.org/10.1021/ma000680q
Publikováno v:
Macromolecular Rapid Communications. 21:35-39
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af900a47a6034d965dec4e20851c8bec
https://doi.org/10.1002/(sici)1521-3927(20000101)21:1<35::aid-marc35>3.0.co
https://doi.org/10.1002/(sici)1521-3927(20000101)21:1<35::aid-marc35>3.0.co
Publikováno v:
Journal of Photopolymer Science and Technology. 11:533-536
The effect of the addition of carbonyl compounds such as amide, imide, urea, and ester derivatives on the dissolution rate of carboxyl-group-containing polymers in an alkaline solution was investigated. Urea derivatives lowered the dissolution rate o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6139c2d480e580ad2b2f6c2e941d624
https://doi.org/10.2494/photopolymer.11.533
https://doi.org/10.2494/photopolymer.11.533
Publikováno v:
Journal of Photopolymer Science and Technology. 9:611-618
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7bfaef8712874a30d6a8d8b224d85257
https://doi.org/10.2494/photopolymer.9.611
https://doi.org/10.2494/photopolymer.9.611
Publikováno v:
Chemistry of Materials. 8:2433-2438
A series of phenylcarbinols have been evaluated as components of chemically amplified resists used for KrF excimer laser lithography. The character of the carbon atom to which the hydroxyl group is...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d334f867c36a40766483b3b94dc1f70
https://doi.org/10.1021/cm960133c
https://doi.org/10.1021/cm960133c
Autor:
Hiroshi Shiraishi, Takumi Ueno, Michiaki Hashimoto, Sonoko Migitaka, Shou-ichi Uchino, Jiro Yamamoto, Kyoko Kojima
Publikováno v:
Journal of Photopolymer Science and Technology. 9:685-691
Chemically amplified negative resists made by utilizing the polarity-change reaction of phenylcarbinol were investigated for electron beam lithography. The resist composed of 1, 3-bis(α-hydroxyisopropyl)benzene (Diol-1), m/p-cresol novolak resin, an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d16d9d70634ce98e8f7ee9a48649ae6d
https://doi.org/10.2494/photopolymer.9.685
https://doi.org/10.2494/photopolymer.9.685
Publikováno v:
Journal of Photopolymer Science and Technology. 8:21-28
Chemical amplification positive resists using tetrahydropyranyl-protected polyvinylphenol (THP-M) were investigated for electron-beam lithography. To enhance the resist performance, we used a new novolak resin and trimethylsulfonium triflate (MES) as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93aa130ad7d6ae93477138b673e38906
https://doi.org/10.2494/photopolymer.8.21
https://doi.org/10.2494/photopolymer.8.21