Zobrazeno 1 - 10
of 70
pro vyhledávání: '"TAKAO IWAYANAGI"'
Autor:
Albin Sandelin, Takashi Gojobori, Timo Lassmann, Hiroshi Asahara, Claes Wahlestedt, Lukasz Huminiecki, Georges St. Laurent, Yoshinari Ando, Takehiro Hashimoto, Denis C. Bauer, Ariel S. Schwartz, Pär G. Engström, Michael Rehli, Hiromi Nishiyori, Katharine M. Irvine, Andreas Lennartsson, Susanne Heinzel, Yoichi Takenaka, Ole Winther, Nicole Cloonan, Megumi Hashimoto, Winston Hide, Takuma Sano, Boris Lenhard, Michiel J. L. de Hoon, Sarah A. Teichmann, Timothy Ravasi, Naoko Imamoto, Ryoko Ishihara, Syuhei Kimura, Mariko Hatakeyama, Yusuke Inoue, Joe Chiba, Shizu Takeda, Linda Wu, Julian Gough, John Quackenbush, Miho Sera, Yasumasa Kimura, Vladimir B. Bajic, Frank Brombacher, Kazumi Yamaguchi, Toshitsugu Okayama, David Fredman, Hideya Kawaji, Colin A. Semple, Ryan J. Taft, Cas Simons, Ko Fujimori, Masaaki Furuno, Andrew Waterhouse, Ajit Kumar, Jesper Tegnér, Tsugumi Kawashima, Nikolai Petrovsky, J. Lynn Fink, Michihira Tagami, Jun Otomo, Etsuko Miyamoto-Sato, Shiro Fukuda, Cameron Ross MacPherson, Shintaro Katayama, Erika Bulger, Toshio Kojima, Alistair R. R. Forrest, Anders Jacobsen, Yasushi Okazaki, Rohan D. Teasdale, Chikatoshi Kai, Johan Björkegren, Takahiro Suzuki, Carsten O. Daub, Christian Schönbach, Miki Kojima, Sebastian Schmeier, Alistair M. Chalk, Hiroaki Kitano, Sanne Nygaard, Kazuhiko Nakabayashi, Kai Tan, Yasuhiro Tomaru, Noriko Ninomiya, Piotr J. Balwierz, Marina Lizio, Altuna Akalin, Maki Asada, Norihiro Maeda, Satoshi Inoue, Takahiro Arakawa, Shohei Noma, Adam Dawe, Michael Hörnquist, Mika Gustafsson, Stuart Meier, Sei Miyamoto, Ryuichiro Kimura, Takeshi Konno, Kate Schroder, Christine A. Wells, Kazunori Waki, Christopher G. Maher, Nicolas Bertin, Ai Kaiho, Chihiro Ogawa, Shinji Kondo, Mika Nakano, Sean M. Grimmond, Matthew J. Sweet, Jun Yasuda, Aleksandar Radovanovic, Valerio Orlando, Yukari Takahashi, Mihaela Zavolan, Jessica Severin, Markus C. Kerr, Anders Krogh, Hiroshi Yanagawa, Hisashi Miura, John S. Mattick, Eivind Valen, Josée Dostie, Magbubah Essack, Monique Maqungo, Haruka Okuda-Yabukami, Oliver Hofmann, Anthony G Beckhouse, Rintaro Saito, Yutaka Nakachi, Yuki Hasegawa, Masanori Suzuki, Mitsuyoshi Murata, Harukazu Suzuki, Nicholas Matigian, Takao Iwayanagi, Hisashi Koga, Jun Kawai, Hideo Matsuda, Charles Plessy, Mikhail Pachkov, Kengo Imamura, Morten Lindow, Yayoi Kitazume, Erik Arner, Kazuho Ikeo, Yoshihide Hayashizaki, Timothy L. Bailey, Geoffrey J. Faulkner, Martin S. Taylor, Mutsumi Kanamori-Katayama, Mandeep Kaur, Christophe Simon, Piero Carninci, Atsutaka Kubosaki, Chika Kawazu, Katsuhiko Shirahige, Adele Kruger, Jessica C. Mar, Kayoko Murakami, David A. Hume, Erik van Nimwegen
Publikováno v:
Nature genetics
ResearcherID
ResearcherID
Using deep sequencing (deepCAGE), the FANTOM4 study measured the genome-wide dynamics of transcription-start-site usage in the human monocytic cell line THP-1 throughout a time course of growth arrest and differentiation. Modeling the expression dyna
Publikováno v:
The Journal of Physical Chemistry. 97:8026-8031
We have studied the photocarrier generation processes of copper, oxotitanium, and [tau]-metal-free phthalocyanines (Pcs) by measuring the temperature dependence of transient photocurrent, lifetime of precursor of free carrier, and electroabsorption s
Publikováno v:
Polymer Engineering and Science. 32:1511-1515
The quantum yield for acid generation from alkyl and arylsulfonic acid esters of pyrogallol was measured in resist films composed of a sulfonate, tBOC-BA, and novolak resin. It was found that the quantum yield increases with decreasing molecular size
Publikováno v:
Polymer. 33:1583-1588
Tetrahydropyranyl (TH) protected poly(p-hydroxystyrene) (PHS) was synthesized and its acid-catalysed thermal deprotection utilized in the design of an alkali developable, positive photoresist system incorporating chemical amplification. The solubilit
Publikováno v:
Journal of Photopolymer Science and Technology. 5:93-99
A photosensitive material called MRI consisting of an aromatic azide (4, 4′-diazido-3, 3′-dimethoxybiphenyl) and a novolak resin has been prepared and evaluated as a negative resist for i-line phase-shifting lithography. Due to the high transpare
Autor:
Kazuhiro Ikeda, Takahiko Usui, Jun Otomo, Shizu Takeda, Satoshi Inoue, Takao Iwayanagi, Yasuyoshi Ouchi, Tomohiko Urano, Atsushi Okada, Yoshiko Ishida
Publikováno v:
Biochemical and biophysical research communications. 383(2)
Terf/TRIM17 is a member of the TRIM family of proteins, which is characterized by the RING finger, B-box, and coiled-coil domains. In the present study, we found that terf interacts with TRIM44. Terf underwent ubiquitination in vitro in the presence
Publikováno v:
Microelectronic Engineering. 13:33-36
A new positive deep UV resist composed of the sulfonic acid ester MeSB as the acid generator and a tetrahydropyranyl inhibitor in a novolak matrix resin was investigated. The resist is very sensitive (D
Publikováno v:
Journal of Photopolymer Science and Technology. 4:455-462
A new simple method was developed to estimate the diffusion range of photogenerated acid in chemical amplification resist systems. The acid mobility was investigated for various process conditions. It was found that prebake and post-exposure-bake con
Publikováno v:
Journal of Photopolymer Science and Technology. 3:385-388
Publikováno v:
Journal of Photopolymer Science and Technology. 3:281-287
The novel photo-acid-generator tri(methanesulfonyloxy)benzene was investigated in a positive deep-UV resist, containing bisphenol A protected with t-butoxycarbonyl groups as inhibitor compound in a novolak matrix polymer. The deprotection reaction by