Zobrazeno 1 - 10
of 1 071
pro vyhledávání: '"T. Witters"'
Autor:
M. Thesberg, Z. Stanojevic, O. Baumgartner, C. Kernstock, D. Leonelli, M. Barci, X. Wang, X. Zhou, H. Jiao, G.L. Donadio, D. Garbin, T. Witters, S. Kundu, H. Hody, R. Delhougne, G. Kar, M. Karner
Owing to the increasing interest in the commercialization of phase-change memory (PCM) devices, a number of TCAD models have been developed for their simulation. These models formulate the melting, amorphization and crystallization of phase-change ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4162c07533c5f97553bcd5bf1c7e9376
http://arxiv.org/abs/2211.06084
http://arxiv.org/abs/2211.06084
Autor:
V. Vega-Gonzalez, J. Bekaert, E. Kesters, Q. T. Le, C. Lorant, O. Varela P., L. Teugels, N. Heylen, Z. El-Mekki, M. van der Veen, T. Webers, C. J. Wilson, H. Vats, L. Rynders, M. Cupak, J. Uk-Lee, Y. Drissi, L. Halipre, A.-L. Charley, P. Verdonck, T. Witters, S. V. Gompel, B. Briggs, Y. Kimura, N. Jourdan, I. Ciofi, A. Gupta, A. Contino, G. Boccardi, S. Lariviere, L. Dupas, B. De-Wachter, E. Vancoille, S. Decoster, F. Lazzarino, M Ercken, P. Debacker, R. Kim, D. Trivkovic, K. Croes, P. Leray, L. Dillemans, Y.-F. Chen, Z. Tokei, J. Versluijs, A. Lesniewska, S. Paolillo, R. Baert, H. Puliyalil
Publikováno v:
2019 IEEE International Electron Devices Meeting (IEDM).
The integration of a three-layer BEOL process which includes an intermediate 21 nm pitch level, relevant for the 3 nm technology node, is demonstrated. A full barrier-less Ruthenium (Ru) dual-damascene (DD) metallization allowed to test different dim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7eecb12b8a386042eac7e3255fe54876
https://doi.org/10.1109/iedm19573.2019.8993538
https://doi.org/10.1109/iedm19573.2019.8993538
Akademický článek
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Autor:
Granjo, Pedro1,2,3 (AUTHOR), Pascoal, Carlota1,2,3,4 (AUTHOR), Gallego, Diana5,6 (AUTHOR), Francisco, Rita3,4 (AUTHOR), Jaeken, Jaak3,7 (AUTHOR), Moors, Tristen8 (AUTHOR), Edmondson, Andrew C.9 (AUTHOR), Kantautas, Kristin A.10 (AUTHOR), Serrano, Mercedes11 (AUTHOR), Videira, Paula A.1,2,3,4 (AUTHOR) p.videira@fct.unl.pt, dos Reis Ferreira, Vanessa1,2,3,4 (AUTHOR) sindromecdg@gmail.com
Publikováno v:
Orphanet Journal of Rare Diseases. 11/1/2024, Vol. 19 Issue 1, p1-17. 17p.
Autor:
Holland, Stephen Henry1,2,3 (AUTHOR), Carmona-Martinez, Ricardo1 (AUTHOR), O'Connor, Kaela1,2 (AUTHOR), O'Neil, Daniel1 (AUTHOR), Roos, Andreas3,4,5 (AUTHOR), Spendiff, Sally1 (AUTHOR), Lochmüller, Hanns1,2,3,6,7 (AUTHOR) hlochmuller@toh.ca
Publikováno v:
Biomolecules (2218-273X). Oct2024, Vol. 14 Issue 10, p1252. 24p.
Autor:
Thorpe, Holly J.1 (AUTHOR), Partha, Raghavendran2 (AUTHOR), Little, Jordan1 (AUTHOR), Clark, Nathan L.2 (AUTHOR), Chow, Clement Y.1 (AUTHOR) cchow@genetics.
Publikováno v:
PLoS Genetics. 9/11/2024, Vol. 20 Issue 9, p1-27. 27p.
Autor:
T. Witters, Marc Heyns, Stefan De Gendt, Annelies Delabie, Martine Claes, G. Loriaux, S. Van Elshocht, Harald F. Okorn-Schmidt
Publikováno v:
Solid State Phenomena. 92:7-10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a885b3d7c6bb0ff491c32242a9981623
https://doi.org/10.4028/www.scientific.net/ssp.92.7
https://doi.org/10.4028/www.scientific.net/ssp.92.7
Akademický článek
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Autor:
Johannes Meersschaut, T. Witters, André Vantomme, Wilfried Vandervorst, M Kayhko, H. P. Lenka, Qiang Zhao
The performance, strengths and limitations of RBS and PIXE for the characterization of trace amounts of Cl in TiN thin films are critically compared. The chlorine atomic concentration in ALD grown TiN thin films on Si is determined for samples grown
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6c22d02f4716925a2b6deb9dc2e8b23f
http://juuli.fi/Record/0040465613
http://juuli.fi/Record/0040465613
Autor:
Klimek, Jordan1 (AUTHOR) jordan.klimek@usz.edu.pl
Publikováno v:
International Journal of Qualitative Methods. 8/26/2024, p1-8. 8p.