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Publikováno v:
Vakuum in Forschung und Praxis. 13:215-220
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::678792286b07cff8a83e7cdcccd111a0
https://doi.org/10.1002/1522-2454(200108)13:4<215::aid-vipr215>3.0.co
https://doi.org/10.1002/1522-2454(200108)13:4<215::aid-vipr215>3.0.co
Autor:
Johannes Windeln, A. Wienss, T. Witke, U. Hartmann, H.-H. Schneider, G. Persch-Schuy, M. Neuhäuser
Publikováno v:
Diamond and Related Materials. 10:1024-1029
Nitrogenated carbon coatings (CN x ) are widely used as protective coatings on magnetic hard disks. In this paper, the mechanical properties of such coatings produced with d.c. magnetron-sputtering and filtered high-current vacuum arcs (HCA) are comp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11190c00d5104361dc00ca3f9d3d493c
https://doi.org/10.1016/s0925-9635(00)00512-4
https://doi.org/10.1016/s0925-9635(00)00512-4
Publikováno v:
Surface and Coatings Technology. 126:81-88
Special features of the filtered high-current pulsed arc deposition (φ-HCA) are presented in comparison with the conventional dc-arc method. The high-current arc technique allows pulse currents of some kiloamperes and averaged arc currents of approx
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b6a19f8d95d1f634a9b8ab80fae0bff5
https://doi.org/10.1016/s0257-8972(00)00544-2
https://doi.org/10.1016/s0257-8972(00)00544-2
Autor:
T. Witke, Bernd Schultrich, H.-J. Scheibe, Jörg Vetter, Peter Siemroth, Otmar Zimmer, Thomas Schuelke
Publikováno v:
Surface and Coatings Technology. :226-232
DC and AC vacuum arc evaporation comprise two techniques currently implemented for thin film deposition, each with specific technical aspects with regard to the discharge systems and their application fields. The DC arc discharge at several 10 A up t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::239a2e28fde8b1f4f7ca720e4a86cf47
https://doi.org/10.1016/s0257-8972(99)00480-6
https://doi.org/10.1016/s0257-8972(99)00480-6
Publikováno v:
Surface and Coatings Technology. :609-613
The principal deposition conditions for the preparation of hard amorphous carbon films with hardness values above 50 GPa are now well known: the high energy of the impinging carbon particles and low deposition temperature. Such conditions are in good
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4ebe90f586bb10470c608b04a4986015
https://doi.org/10.1016/s0257-8972(99)00271-6
https://doi.org/10.1016/s0257-8972(99)00271-6
Autor:
J. Jojic, S. Scherrer, Günter Borchardt, B. Schultrich, T. Witke, S. Weber, R. Weiß, Holger Fritze, Claus H. Rüscher
Publikováno v:
Journal of the European Ceramic Society. 18:2351-2364
For an industrial Si-SiC coated C/C material (reference material) the temperature dependence of the linear rate of mass loss is interpreted in the temperature range 773 < T < 1973 K. The Arrhenius plot of the thermogravimetrically determined oxidatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e191a4b42851236614d1b6e55526ead1
https://doi.org/10.1016/s0955-2219(98)00242-8
https://doi.org/10.1016/s0955-2219(98)00242-8
Publikováno v:
IEEE Transactions on Plasma Science. 23:919-925
The main parameters and dimensions of cathode spots have been under discussion for years. To solve these current questions, a new system was specially designed. The image converting high speed framing camera (HSFC) combines a micrometer lateral resol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92d5aa1f6500df7b7bf911fd5d4e4ed4
https://doi.org/10.1109/27.476476
https://doi.org/10.1109/27.476476
Publikováno v:
Surface and Coatings Technology. :713-718
In both pulsed laser deposition (PLD) and vacuum arc deposition (VAD) the target material is evaporated and ionised in an explosive process of some nanoseconds duration. In PLD the explosive evaporation is caused by very high power densities (10 7 to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::72e872b79f25eadc96f356a3a0b87b08
https://doi.org/10.1016/0257-8972(94)90243-7
https://doi.org/10.1016/0257-8972(94)90243-7
Autor:
Peter Siemroth, T. Witke
Publikováno v:
Proceedings ISDEIV. 18th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.98CH36073).
A pulsed high current metal ion source that produces a metallic plasma flux was designed and successfully used for film deposition. The plasma flux consists of the fully ionized plasma beam produced by a pulsed high current vacuum arc transported thr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::11f5bcc8d41803dd46e30cb3f87968ae
https://doi.org/10.1109/deiv.1998.738784
https://doi.org/10.1109/deiv.1998.738784