C. レーザーエネルギー応用

Autor: H. Daido, N. Sakaya, Stephane Sebban, J. Tajima, M. Suzuki, M. Matsumura, V. Kmetik, H. Fiedorowicz, A. Bartnik, M. Szczurek, T. Wilhein, H. Matsuyama, H. Kumagai, Y. Iimura, K. Midorikawa, M. Obara, E. Takahashi, K. Kuwahara, Y. Matsumoto, Y. Owadano, I. Matsushima, I. Okuda, T. Tomie, E. Miura, H. Yashiro, S. Kato, Tsuyosi Fukuda, Hitoshi Nakano, Uichi Kubo, S. Murayama, T. Norimatu, T. Yamanaka, Hiromi Fujii, Satomi Hattori, Aki Shimamura, Tadao Konishi, Hiroki Yoshida, Yukio Sakagami, Akihito Hongo, Mitsunobu Miyagi, Y. Shimada, S. Uchida, H. Yasuda, S. Motokoshi, K. Tsubakimoto, M. Fujita, M. Hashida, Y. Ishikubo, Z. I. Kawasaki, M. Adachi, C. Yamanaka, H. Niki, K. Maruyama, H. Sawazaki, T. Nishimura, I. Kitajima, Changhwan LIM, Satoshi MORIKAWA, Koji NAGASAKA, Kaname OKADA, Yasukazu IZAWA, Y. Kato, H. Yoshida, H. Fujita, S. Nakai, S. Kawana, H. Asai, H. Yoneda, K. Ueda, Hisanao Hazama, Kazuyoshi Koyama, Mitsumori Tanimoto, Tohru Urano, Hiroki Ueyama, Tomoyuki Kuge, Sakae Kawato, Shuji Sakabe

Publikováno v: The Review of Laser Engineering. 26:81-86,91

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::34bfe45a1925c49a898901482198241c
https://doi.org/10.2184/lsj.26.supplement_81

Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach

Autor: J. Lenz, N. Krupp, T. Wilhein, S. Irsen, Ian McNulty, Catherine Eyberger, Barry Lai

Publikováno v: AIP Conference Proceedings.

Diffractive optical elements are important components for applications in soft x‐ray and extreme ultraviolet radiation. At present, the standard fabrication method for such optics is based on electron beam lithography followed by nanostructuring. T

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c03f7e1f379d341fb71676c8ec8ff442
https://doi.org/10.1063/1.3625315

Absolute measurement of the spectral brilliance of a subpicosecond UV-laser induced soft x-ray source

Autor: R. Häßner, W. Theobald, R. Sauerbrey, D. Altenbernd, U. Teubner, E. Forster, T. Wilhein, B. Niemann, G. Schmahl

Publikováno v: Applications of High Field and Short Wavelength Sources VII.

We have investigated the spectral brilliance of subpicosecond UV-laser-plasmas as a source for the soft x-ray microscopy in the so-called ‘water-window’. The spectral range between the absorption K-edges of carbon (4.36 nm) and oxygen (2.32 nm) i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9f393d2adc5b550c687227f9ea7f1c61
https://doi.org/10.1364/hfsw.1997.the31

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