Zobrazeno 1 - 8
of 8
pro vyhledávání: '"T. V. Petlitskaya"'
Autor:
P. A. Kholov, N. V. Gaponenko, K. V. Shaidakova, V. I. Krymski, V. A. Filipenya, T. V. Petlitskaya, V. V. Kolos, A N. Pyatlitski
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 18, Iss 1, Pp 74-80 (2020)
The objective of the work is investigation the dielectric permittivity and dielectric loss tangent of BaTiO3 films in a capacitor structure formed by sol – gel method on a Si/TiOx/Pt substrate. The basis of this capacitor is a four-layer film of ba
Externí odkaz:
https://doaj.org/article/96b1f395a79e44028a37d912887eb71d
Autor:
T. V. Petlitskaya, S. Kh. Suleymanov, A. N. Petlitskii, V. G. Dyskin, V.F. Gremenok, M. U. Djanklich, N. A. Kulagina, V. A. Ivanov
Publikováno v:
Applied Solar Energy. 56:186-191
In this study, a technology producing undoped crystalline zinc oxide films with purposefully changed electrical resistance ρ = 3 × 10–4–1 × 107 Ω cm has been developed. The relationship between the electrical characteristics of ZnO layers and
Autor:
V. P. Kladko, Alexander Belyaev, A. S. Pilipchuk, T. V. Petlitskaya, V. V. Shynkarenko, A. S. Slepova, R. V. Konakova, A. I. Lubchenko, A. V. Sachenko, N. V. Safryuk-Romanenko, V. N. Sheremet, N. S. Boltovets, V. A. Pilipenko
Publikováno v:
Semiconductors. 53:469-476
The temperature dependences of the specific contact resistance of silicon ρc with a doping step are measured experimentally and described theoretically. The measurements are performed in the temperature range from 4.2 to 380 K. It is established tha
Autor:
S. R. Syrtsov, Yu. V. Medvedeva, V. M. Laletin, V. L. Trublovsky, V. N. Shut, Kazimir Yanushkevich, T. V. Petlitskaya, M. V. Bushinskii
Publikováno v:
Physics of the Solid State. 60:1744-1751
The phase composition, microstructure, and dielectric, ferroelectric, magnetic, and magnetoelectric properties of bulk ceramic (1 – x)PZT–xNiFe1.9Co0.02О4 – δ composites with 3–0 connectivity have been studied. Using X-ray diffraction and e
Autor:
Alexander Belyaev, A. O. Vinogradov, T. V. Petlitskaya, A. V. Sachenko, R. V. Konakova, Ya. Ya. Kudryk, V. N. Sheremet, V. A. Anischik, V. A. Pilipenko, N. S. Boltovets
Publikováno v:
Semiconductors. 48:492-496
It is experimentally found that an ohmic contact based on Au-Pt-Ti-Pd-n + �Si metallization is formed due to nanoscale metal shunts containing Si, Au, and Pt in the region of the interface with n + �Si, which appears during heat treatment at T =
Publikováno v:
Journal of Engineering Physics and Thermophysics. 81:622-626
Results of the use of nanosecond laser pulses in the technology of production of very-large-scale integration circuits are presented. It is shown that, depending on the conditions of processing of silicon by these pulses, they can avoid mechanical fa
Publikováno v:
Journal of Engineering Physics and Thermophysics. 80:617-624
A model for calculation of the parameters of a bipolar transistor has been proposed and the regularities of their change in fast thermal treatment of ion-doped silicon layers have been established.
Publikováno v:
Journal of Engineering Physics and Thermophysics. 76:193-196
A variant of a combined dielectric for the condensers of very large‐scale integrated circuits (VLSICs) has been proposed. Its electrophysical and mechanical properties have been analyzed. The influence of the thickness of each of the dielectrics on